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通过熔融氢氧化钾蚀刻观察到的碳化硅单晶中的微管

Micropipes in SiC Single Crystal Observed by Molten KOH Etching.

作者信息

Wang Hejing, Yu Jinying, Hu Guojie, Peng Yan, Xie Xuejian, Hu Xiaobo, Chen Xiufang, Xu Xiangang

机构信息

State Key Laboratory of Crystal Materials, Shandong University, Jinan 250100, China.

Institute of Novel Semiconductors, Shandong University, Jinan 250100, China.

出版信息

Materials (Basel). 2021 Oct 8;14(19):5890. doi: 10.3390/ma14195890.

Abstract

Micropipe, a "killer" defect in SiC crystals, severely hampers the outstanding performance of SiC-based devices. In this paper, the etching behavior of micropipes in 4H-SiC and 6H-SiC wafers was studied using the molten KOH etching method. The spectra of 4H-SiC and 6H-SiC crystals containing micropipes were examined using Raman scattering. A new Raman peak accompanying micropipes located near -784 cm was observed, which may have been induced by polymorphic transformation during the etching process in the area of micropipe etch pits. This feature may provide a new way to distinguish micropipes from other defects. In addition, the preferable etching conditions for distinguishing micropipes from threading screw dislocations (TSDs) was determined using laser confocal microscopy, scanning electron microscopy (SEM) and optical microscopy. Meanwhile, the micropipe etching pits were classified into two types based on their morphology and formation mechanism.

摘要

微管道是碳化硅晶体中的一种“致命”缺陷,严重阻碍了碳化硅基器件的卓越性能。本文采用熔融氢氧化钾蚀刻法研究了4H-SiC和6H-SiC晶圆中微管道的蚀刻行为。利用拉曼散射对含有微管道的4H-SiC和6H-SiC晶体光谱进行了检测。观察到一个伴随微管道的新拉曼峰位于-784 cm附近,这可能是在微管道蚀刻坑区域的蚀刻过程中由多晶型转变引起的。这一特征可能为区分微管道与其他缺陷提供一种新方法。此外,利用激光共聚焦显微镜、扫描电子显微镜(SEM)和光学显微镜确定了区分微管道与螺旋位错(TSD)的最佳蚀刻条件。同时,根据微管道蚀刻坑的形态和形成机制将其分为两种类型。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/f557/8510436/e0e3fb574d8f/materials-14-05890-g001.jpg

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