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三甲基铝与臭氧反应机理的理论研究

Theoretical Study of the Mechanism for the Reaction of Trimethylaluminum with Ozone.

作者信息

Kayanuma Megumi, Choe Yoong-Kee, Hagiwara Takayuki, Kameda Naoto, Shimoi Yukihiro

机构信息

Research Center for Computational Design of Advanced Functional Materials, National Institute of Advanced Industrial Science and Technology, Central 2, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan.

Meiden Nanoprocess Innovations, Inc., 1569-9 Kotehashi-Mura, Hanamigawa-Ku, Chiba, Chiba 262-0013, Japan.

出版信息

ACS Omega. 2021 Sep 28;6(40):26282-26292. doi: 10.1021/acsomega.1c03326. eCollection 2021 Oct 12.

DOI:10.1021/acsomega.1c03326
PMID:34660987
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC8515592/
Abstract

The mechanism for the reaction of trimethylaluminum (TMA, Al(CH)) with ozone (O) was investigated in detail using density functional theory calculations to understand the atomic layer deposition processes that form aluminum oxide surfaces. We examined the reactions of TMA and some possible intermediates with O and revealed plausible paths to form methoxy (-OCH), formate (-OCHO), bicarbonate (-COH), and hydroxyl (-OH) species. These species have been observed in previous experimental studies. It was shown that TMA easily reacts with O to generate the Al(CH)(OCH)(O) intermediate. The subsequent reaction between the OCH and O groups finally generated an intermediate having a formate group. When all of the CH groups are converted into OCH or OCHO, O will react with these groups. In the latter reaction, bicarbonate was shown to be formed.

摘要

使用密度泛函理论计算详细研究了三甲基铝(TMA,Al(CH₃)₃)与臭氧(O₃)反应的机理,以了解形成氧化铝表面的原子层沉积过程。我们研究了TMA和一些可能的中间体与O₃的反应,并揭示了形成甲氧基(-OCH₃)、甲酸酯(-OCHO)、碳酸氢根(-CO₂H)和羟基(-OH)物种的合理途径。这些物种在先前的实验研究中已被观察到。结果表明,TMA很容易与O₃反应生成Al(CH₃)₂(OCH₃)(O)中间体。随后,OCH₃和O基团之间的反应最终生成了一个具有甲酸酯基团的中间体。当所有的CH₃基团都转化为OCH₃或OCHO时,O₃会与这些基团反应。在后一种反应中,显示会形成碳酸氢根。

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本文引用的文献

1
Matrix Isolation Studies of Novel Intermediates in the Reaction of Trimethylaluminum with Ozone.
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Influence of surface temperature on the mechanism of atomic layer deposition of aluminum oxide using an oxygen plasma and ozone.表面温度对使用氧等离子体和臭氧进行氧化铝原子层沉积机制的影响。
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Surface reaction mechanisms during ozone and oxygen plasma assisted atomic layer deposition of aluminum oxide.在臭氧和氧气等离子体辅助原子层沉积氧化铝过程中的表面反应机理。
热原子层沉积理论发展的最新进展:综述
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