Bafekry A, Faraji M, Karbasizadeh S, Khatibani A Bagheri, Ziabari A Abdolahzadeh, Gogova D, Ghergherehchi M
Department of Radiation Application, Shahid Beheshti University, 19839 69411 Tehran, Iran.
TOBB University of Economics and Technology, Sogutozu Caddesi No 43 Sogutozu, 06560, Ankara, Turkey.
Phys Chem Chem Phys. 2021 Nov 3;23(42):24301-24312. doi: 10.1039/d1cp03421a.
Very recently, the 2D form of BeO monolayer has been successfully fabricated [Hui Zhang , , 2021, , 2497]. Motivated by these exciting experimental results on 2D layered BeO structures, the effect of atom adsorption, substitutional doping and vacancy defects on the electronic and magnetic properties of a hexagonal BeO monolayer have been systematically investigated employing density functional theory-based first-principles calculations. We found out that BeO monolayer is a semiconductor with an indirect band gap of 5.9 eV. Next, a plethora of atoms (27 in total) were adsorbed on the surface of BeO monolayer to tailor its electronic properties. The bond length, work function, difference in charge and magnetic moment were also calculated for all modifications covering the vacancy defects and substitutional doping. The band gap is also supplied for these changes, showing how these adjustments can provide amazing opportunities in granting a variety of options in band gap engineering and in transforming the BeO monolayer from a semiconductor to a dilute magnetic semiconductor or half-metal in view of different applications. The formation energy of the defects was also computed as an important indicator for the stability of the defected structures, when created in a real experiment. We have theoretically demonstrated several possible approaches to modify the properties of BeO monolayer in a powerful and controllable manner. Thus, we expect to inspire many experimental studies focused on two dimensional BeO growth and property tuning, and exploration for applications in advanced nanoelectronics.
最近,氧化铍单层的二维形式已成功制备出来[张辉,,2021,,2497]。受这些关于二维层状氧化铍结构的令人兴奋的实验结果的启发,利用基于密度泛函理论的第一性原理计算,系统地研究了原子吸附、替代掺杂和空位缺陷对六方氧化铍单层的电子和磁性性质的影响。我们发现氧化铍单层是一种间接带隙为5.9电子伏特的半导体。接下来,大量原子(总共27种)被吸附在氧化铍单层表面以调整其电子性质。还计算了涵盖空位缺陷和替代掺杂的所有改性的键长、功函数、电荷差和磁矩。还给出了这些变化的带隙,展示了这些调整如何能在带隙工程中提供多种选择,并鉴于不同应用将氧化铍单层从半导体转变为稀磁半导体或半金属方面提供惊人的机会。缺陷的形成能也被计算出来,作为在实际实验中产生时缺陷结构稳定性的重要指标。我们从理论上证明了几种以强大且可控的方式改变氧化铍单层性质的可能方法。因此,我们期望能激发许多专注于二维氧化铍生长和性质调控以及在先进纳米电子学中应用探索的实验研究。