Chen Fei, Chen Bo, Lin Hongzhe, Kong Yachen, Liu Xin, Zhan Xuepeng, Chen Jiezhi
School of Information Science and Engineering, Shandong University, Qingdao 266237, China.
State Key Laboratory of High-End Server & Storage Technology, Testing and Evaluation Research Department, Jinan 250000, China.
Micromachines (Basel). 2021 Sep 25;12(10):1152. doi: 10.3390/mi12101152.
Temperature effects should be well considered when designing flash-based memory systems, because they are a fundamental factor that affect both the performance and the reliability of NAND flash memories. In this work, aiming to comprehensively understanding the temperature effects on 3D NAND flash memory, triple-level-cell (TLC) mode charge-trap (CT) 3D NAND flash memory chips were characterized systematically in a wide temperature range (-30~70 °C), by focusing on the raw bit error rate (RBER) degradation during program/erase (P/E) cycling (endurance) and frequent reading (read disturb). It was observed that (1) the program time showed strong dependences on the temperature and P/E cycles, which could be well fitted by the proposed temperature-dependent cycling program time (TCPT) model; (2) RBER could be suppressed at higher temperatures, while its degradation weakly depended on the temperature, indicating that high-temperature operations would not accelerate the memory cells' degradation; (3) read disturbs were much more serious at low temperatures, while it helped to recover a part of RBER at high temperatures.
在设计基于闪存的存储系统时,应充分考虑温度影响,因为温度是影响NAND闪存性能和可靠性的一个基本因素。在这项工作中,为了全面了解温度对3D NAND闪存的影响,通过关注编程/擦除(P/E)循环(耐久性)和频繁读取(读干扰)过程中的原始误码率(RBER)退化情况,在较宽温度范围(-30~70°C)内对三级单元(TLC)模式电荷俘获(CT)3D NAND闪存芯片进行了系统表征。观察到:(1)编程时间对温度和P/E循环有很强的依赖性,所提出的温度相关循环编程时间(TCPT)模型能够很好地拟合这种依赖性;(2)在较高温度下RBER可以得到抑制,并且其退化对温度的依赖性较弱,这表明高温操作不会加速存储单元的退化;(3)读干扰在低温时更为严重,而在高温时有助于恢复一部分RBER。