Yin Lianmin, Hu Hao, Guan Chaoliang, Dai Yifan, Li Zelong
Laboratory of Science and Technology on Integrated Logistics Support, College of Intelligence Science and Technology, National University of Defense Technology, Changsha 410073, China.
Hunan Key Laboratory of Ultra-Precision Machining Technology, Changsha 410073, China.
Micromachines (Basel). 2021 Sep 25;12(10):1154. doi: 10.3390/mi12101154.
The computer-controlled optical surface (CCOS) can process good optical surfaces, but its edge effect greatly affects its development and application range. In this paper, based on the two fundamental causes of the CCOS's edge effect-namely the nonlinear variation of edge pressure and the unreachable edge removal-a combined polishing method of double-rotor polishing and spin-polishing is proposed. The model of the combined polishing method is established and theoretically analyzed. Combined with the advantages of double-rotor polishing and spin-polishing, the combined polishing process can achieve full-aperture machining without pressure change. Finally, the single-crystal silicon sample with a diameter of 100 mm is polished by the combined polishing process. The results show that, compared with the traditional CCOS polishing, the residual error of the sample after the combined polishing process is more convergent, and the edge effect is effectively controlled.
计算机控制光学表面加工（CCOS）能够加工出优质的光学表面，但其边缘效应极大地影响了它的发展及应用范围。本文基于CCOS边缘效应的两个根本原因，即边缘压力的非线性变化和边缘去除不可达，提出了一种双转子抛光与自旋抛光相结合的复合抛光方法。建立了复合抛光方法的模型并进行了理论分析。结合双转子抛光和自旋抛光的优点，复合抛光工艺可在无压力变化的情况下实现全口径加工。最后，采用复合抛光工艺对直径为100mm的单晶硅样品进行了抛光。结果表明，与传统的CCOS抛光相比，复合抛光工艺后样品的残余误差更收敛，边缘效应得到有效控制。
