Vakarin Vladyslav, Melati Daniele, Dinh Thi Thuy Duong, Le Roux Xavier, Kan Warren Kut King, Dupré Cécilia, Szelag Bertrand, Monfray Stéphane, Boeuf Frédéric, Cheben Pavel, Cassan Eric, Marris-Morini Delphine, Vivien Laurent, Alonso-Ramos Carlos Alberto
Centre de Nanosciences et de Nanotechnologies, CNRS, Université Paris-Saclay, 91120 Palaiseau, France.
LETI, University Grenoble Alpes and CEA, 38054 Grenoble, France.
Nanomaterials (Basel). 2021 Nov 3;11(11):2949. doi: 10.3390/nano11112949.
Subwavelength grating (SWG) metamaterials have garnered a great interest for their singular capability to shape the material properties and the propagation of light, allowing the realization of devices with unprecedented performance. However, practical SWG implementations are limited by fabrication constraints, such as minimum feature size, that restrict the available design space or compromise compatibility with high-volume fabrication technologies. Indeed, most successful SWG realizations so far relied on electron-beam lithographic techniques, compromising the scalability of the approach. Here, we report the experimental demonstration of an SWG metamaterial engineered beam splitter fabricated with deep-ultraviolet immersion lithography in a 300-mm silicon-on-insulator technology. The metamaterial beam splitter exhibits high performance over a measured bandwidth exceeding 186 nm centered at 1550 nm. These results open a new route for the development of scalable silicon photonic circuits exploiting flexible metamaterial engineering.
亚波长光栅（SWG）超材料因其塑造材料特性和光传播的独特能力而备受关注，这使得实现具有前所未有的性能的器件成为可能。然而，实际的SWG实现受到制造限制的约束，例如最小特征尺寸，这限制了可用的设计空间或损害了与大批量制造技术的兼容性。事实上，迄今为止，大多数成功的SWG实现都依赖于电子束光刻技术，这损害了该方法的可扩展性。在此，我们报告了一种采用300毫米绝缘体上硅技术的深紫外浸没光刻制造的SWG超材料工程分束器的实验演示。该超材料分束器在以1550纳米为中心、超过186纳米的测量带宽上表现出高性能。这些结果为利用灵活的超材料工程开发可扩展硅光子电路开辟了一条新途径。
