Osipkov Alexey, Makeev Mstislav, Konopleva Elizaveta, Kudrina Natalia, Gorobinskiy Leonid, Mikhalev Pavel, Ryzhenko Dmitriy, Yurkov Gleb
Laboratory of EMI Shielding Materials, Bauman Moscow State Technical University, 105005 Moscow, Russia.
N.N. Semenov Federal Research Center for Chemical Physics Russian Academy of Sciences, 119991 Moscow, Russia.
Materials (Basel). 2021 Nov 25;14(23):7178. doi: 10.3390/ma14237178.
The study was devoted to the creation of transparent electrodes based on highly conductive mesh structures. The analysis and reasonable choice of technological approaches to the production of such materials with a high Q factor (the ratio of transparency and electrical conductivity) were carried out. The developed manufacturing technology consists of the formation of grooves in a transparent substrate by photolithography methods, followed by reactive ion plasma etching and their metallization by chemical deposition using the silver mirror reaction. Experimental samples of a transparent electrode fabricated using this technology have a sheet resistance of about 0.1 Ω/sq with a light transmittance in the visible wavelength range of more than 60%.
该研究致力于基于高导电网状结构制造透明电极。对生产具有高Q因子（透明度与电导率之比）的此类材料的工艺方法进行了分析和合理选择。所开发的制造技术包括通过光刻方法在透明基板上形成凹槽，随后进行反应离子等离子体蚀刻，并利用银镜反应通过化学沉积对其进行金属化处理。使用该技术制造的透明电极实验样品的薄层电阻约为0.1Ω/sq，在可见光波长范围内的透光率超过60%。
