Gérardin M, Gilabert E, Horlait D, Barthe M-F, Carlot G
CEA, DEN, DEC, F-13108 Saint Paul lez Durance Cedex, France.
Université de Lorraine, GeoRessources, CNRS, F54000 Nancy, France.
Data Brief. 2021 Nov 26;39:107645. doi: 10.1016/j.dib.2021.107645. eCollection 2021 Dec.
We present the raw data obtained from release rate at 1300°C of Xe and Kr implanted in UO, related to [1]. We performed different sample preparation (polishing treatment) on polycrystalline and monocrystalline UO. Ion implantation were performed at various fluences between 9.5 × 10 to 5 × 10 i/cm in UO samples. Release rate of Xe and Kr are obtained at 1300°C under vacuum from desorption experiments performed on the PIAGARA plateform at the CENBG (Centre d'Etudes Nucléaires de Bordeaux-Gradignan). Since we made a variety of samples depending on multiple parameters (sample type, sample preparation, ion implantation type and fluence), these data represent a serious amount of work that could be saved for the scientific community that might use them for other purposes such as burst modelling.
我们展示了与[1]相关的,在1300°C下从注入UO中的Xe和Kr的释放速率获得的原始数据。我们对多晶和单晶UO进行了不同的样品制备(抛光处理)。在UO样品中,以9.5×10至5×10 i/cm之间的各种注量进行离子注入。在CENBG(波尔多 - 格拉迪尼昂核研究中心)的PIAGARA平台上,通过在真空中于1300°C进行的解吸实验获得Xe和Kr的释放速率。由于我们根据多个参数(样品类型、样品制备、离子注入类型和注量)制作了各种样品,这些数据代表了大量的工作,可为可能将其用于其他目的(如爆发建模)的科学界节省这些工作。