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通过酸改性实现倒金字塔形貌控制及其在PERC太阳能电池中的应用

Inverted Pyramid Morphology Control by Acid Modification and Application for PERC Solar Cells.

作者信息

Gao Kun, Liu Ying, Cheng Hao, Zhong Sihua, Tong Rui, Kong Xiangyang, Song Xiaomin, Huang Zengguang

机构信息

School of Science, and School of Chemical Engineering, Jiangsu Ocean University, Lianyungang 222005, Jiangsu Province, PR China.

JA Solar, Yangzhou 225131, Jiangsu Province, PR China.

出版信息

ACS Omega. 2021 Nov 25;6(48):32925-32929. doi: 10.1021/acsomega.1c04972. eCollection 2021 Dec 7.

Abstract

Silicon inverted pyramid (IP) structures, with lower reflectance and increased surface recombination, are one of the best choices for light-trapping structures of high-efficiency silicon solar cells. The solution process of IP generally goes through three main steps: porous silicon etched by metal-assisted chemical etching, acid etching, and alkali anisotropic etching. In this paper, the role that acid modification plays in IP preparation and the application of our optimized texture for passivated emitter and rear solar cells (PERC) were investigated. Experimental results show that acid plays a decisive role in optimizing and modifying the morphology of porous silicon; thus, the morphology of porous silicon has no direct influence on the morphology of IP. In addition, the opening size of IP is mainly determined by the size of silicon micron holes modified by the acid process. PC1D simulation results manifest that IPs can increase the short-circuit current density ( ) of devices by 1.04 mA/cm and power conversion efficiency by 0.55%; hence, our optimized IP-based PERC achieve the highest simulative conversion efficiency of 23.21%. This is an effective and important way to manipulate the structure of IP, which points out the direction of fabrication and application of high-efficiency IP textures.

摘要

硅倒金字塔(IP)结构具有较低的反射率和增加的表面复合,是高效硅太阳能电池光捕获结构的最佳选择之一。IP的制备过程通常经历三个主要步骤:金属辅助化学蚀刻蚀刻多孔硅、酸蚀刻和碱各向异性蚀刻。本文研究了酸改性在IP制备中的作用以及我们优化的织构在钝化发射极和背接触太阳能电池(PERC)中的应用。实验结果表明,酸在优化和改性多孔硅的形貌方面起着决定性作用;因此,多孔硅的形貌对IP的形貌没有直接影响。此外,IP的开口尺寸主要由酸处理改性的硅微米孔的尺寸决定。PC1D模拟结果表明,IP可以使器件的短路电流密度( )增加1.04 mA/cm ,功率转换效率提高0.55%;因此,我们优化的基于IP的PERC实现了23.21%的最高模拟转换效率。这是一种操纵IP结构的有效且重要的方法,为高效IP织构的制备和应用指明了方向。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b070/8655889/61c2705238d5/ao1c04972_0002.jpg

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