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注入势垒对垂直有机场效应晶体管的影响

Influence of Injection Barrier on Vertical Organic Field Effect Transistors.

作者信息

Dahal Drona, Paudel Pushpa Raj, Kaphle Vikash, Radha Krishnan Raj Kishen, Lüssem Björn

机构信息

Department of Physics, Kent State University, Kent, Ohio 44242, United States.

Institute for Microsensors, -actuators, and -systems (IMSAS), University of Bremen, Bremen 28334, Germany.

出版信息

ACS Appl Mater Interfaces. 2022 Feb 9;14(5):7063-7072. doi: 10.1021/acsami.1c20382. Epub 2022 Jan 25.

Abstract

Organic field-effect transistors (OFETs) have shown great potential for applications that require low temperature deposition on large and flexible substrates. To increase their performance, in particular a high transconductance and transit frequency, the transistor channel length has to be scaled into the submicrometer regime, which can be easily achieved in vertical organic field effect transistors (VOFETs). However, despite high performance observed in VOFETs, these transistors usually suffer from short channel effects like weak saturation of the drain current and direct source-drain leakage resulting in large off currents. Here, we study the influence of the injection barrier at the source electrode on the OFF currents, on/off ratio, and transconductance of vertical OFETs. We use two semiconducting materials, 2,6-diphenyl anthracene (DPA), and to vary the injection barrier at the source electrode and are able to show that increasing the Schottky barrier at the source electrode can decrease the direct source/drain leakage by 3 orders of magnitude. However, the increased injection barrier at the source electrode comes at the expense of an increased contact resistance, which in turn will decrease its transconductance and transit frequency. With the help of a 2D drift-diffusion simulation we show that the trade-off between low off currents and high transconductance is inherent to the current VOFET device setup and that new approaches have to be found to design VOFETs that combine good switching properties with high performance.

摘要

有机场效应晶体管(OFET)在需要在大型柔性基板上进行低温沉积的应用中显示出巨大潜力。为了提高其性能,特别是提高跨导和传输频率,晶体管沟道长度必须缩小到亚微米范围,这在垂直有机场效应晶体管(VOFET)中很容易实现。然而,尽管VOFET表现出高性能,但这些晶体管通常会受到短沟道效应的影响,如漏极电流饱和不足和源漏直接泄漏,导致关态电流较大。在此,我们研究源电极处的注入势垒对垂直OFET的关态电流、开/关比和跨导的影响。我们使用两种半导体材料,2,6-二苯基蒽(DPA),来改变源电极处的注入势垒,并能够证明增加源电极处的肖特基势垒可以将源漏直接泄漏降低3个数量级。然而,源电极处增加的注入势垒是以增加接触电阻为代价的,这反过来又会降低其跨导和传输频率。借助二维漂移扩散模拟,我们表明低关态电流和高跨导之间的权衡是当前VOFET器件设置所固有的,必须找到新的方法来设计兼具良好开关特性和高性能的VOFET。

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