Chen Chaoyu, Sun Mingxu, Cheng Zhi, Liang Yao
School of Materials Science and Engineering, Dalian Jiaotong University, Dalian 116028, China.
Materials (Basel). 2022 Jan 20;15(3):780. doi: 10.3390/ma15030780.
In order to present the multiple reflow process during electronic packaging, the influence of the different short-time reheating temperatures on the microstructure and shear strength of the Cu/Au80Sn20/Cu solder joints was studied and discussed. The results showed that high-quality Cu/Au80Sn20/Cu solder joints were obtained with 30 °C for 3 min. The joints were mainly composed of the ζ-(Au,Cu)Sn intermetallic compound (IMC) with an average thickness of 8 μm between Cu and solder matrix, and (ζ-(Au,Cu)Sn +δ-(Au,Cu)Sn) eutectic structure in the solder matrix. With an increase in the multiple reflow temperature from 180 °C to 250 °C, the microstructure of the joint interface showed little change due to the barrier effect of the formed ζ IMC layer and the limitation of short-time reheating on the element diffusion. The eutectic structures in the solder matrix were coarsened and transformed from lamellar to the bulk morphology. The shear strength of the as-welded joint reached 31.5 MPa. The joint shear strength decreased slightly with reheating temperatures lower than 200 °C, while it decreased significantly (by about 10%) with reheating temperatures above 250 °C compared to the as-welded joint. The shear strength of the joints was determined by the brittle solder matrix, showing that the joint strength decreased with the coarsening of the δ phase in the eutectic structure.
为了呈现电子封装过程中的多次回流工艺,研究并讨论了不同短时再加热温度对Cu/Au80Sn20/Cu焊点微观结构和剪切强度的影响。结果表明,在30℃下保持3分钟可获得高质量的Cu/Au80Sn20/Cu焊点。焊点主要由ζ-(Au,Cu)Sn金属间化合物(IMC)组成,其在Cu与焊料基体之间的平均厚度为8μm,焊料基体中存在(ζ-(Au,Cu)Sn +δ-(Au,Cu)Sn)共晶组织。随着多次回流温度从180℃升高到250℃,由于形成的ζ IMC层的阻挡作用以及短时再加热对元素扩散的限制,接头界面的微观结构变化不大。焊料基体中的共晶组织粗化,从层片状转变为块状形态。焊接态接头的剪切强度达到31.5MPa。当再加热温度低于200℃时,接头剪切强度略有下降,而当再加热温度高于250℃时,与焊接态接头相比,接头剪切强度显著下降(约10%)。接头的剪切强度由脆性的焊料基体决定,这表明接头强度随着共晶组织中δ相的粗化而降低。