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二维压电定位平台的滞后特性及多点喷射补偿

Hysteresis Characteristics and MPI Compensation of Two-Dimensional Piezoelectric Positioning Stage.

作者信息

Wang Wanqiang, Zhang Jiaqi, Xu Ming, Chen Guojin

机构信息

School of Mechanical Engineering, Hangzhou Dianzi University, Hangzhou 310018, China.

出版信息

Micromachines (Basel). 2022 Feb 18;13(2):321. doi: 10.3390/mi13020321.

DOI:10.3390/mi13020321
PMID:35208445
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC8874454/
Abstract

Piezoelectric positioning stage is the core component of precision positioning system and advanced instrument. Its hysteresis characteristics, especially rate-dependent characteristics, are the main factors affecting the positioning or control accuracy. The multi-slope Prandtl-Ishlinskii (MPI) based hysteresis modeling and compensation experiments of two-dimensional piezoelectric positioning stage are discussed. The impact of the driving voltage amplitude and frequency on the hysteresis characteristics of uniaxial piezoelectric actuator in the piezoelectric positioning stage are studied, especially the influence of variable-frequency voltages on the output displacement of a piezoelectric actuator. The MPI compensation control of two-dimensional piezoelectric positioning stage is carried out, and the fitting coefficient is proposed to evaluate the hysteresis compensation accuracy of MPI model. Under the full range driving voltage of 20~120 V, the fitting coefficient reaches more than 99.6%. The experiments of feedforward compensation and feedback compensation are implemented. Having applied the composite triangular-wave signal, the average absolute displacement error of the piezoelectric actuator is 0.1192 μm, as well as the mean square error 0.2949 μm. It demonstrates that the MPI model is effective against hysteresis for two-dimensional piezoelectric positioning stage.

摘要

压电定位平台是精密定位系统和先进仪器的核心部件。其滞后特性，尤其是与速率相关的特性，是影响定位或控制精度的主要因素。本文讨论了基于多斜率普朗特-伊什林斯基（MPI）的二维压电定位平台滞后建模与补偿实验。研究了驱动电压幅值和频率对压电定位平台中单轴压电驱动器滞后特性的影响，特别是变频电压对压电驱动器输出位移的影响。对二维压电定位平台进行了MPI补偿控制，并提出了拟合系数来评估MPI模型的滞后补偿精度。在20~120V的全范围驱动电压下，拟合系数达到99.6%以上。进行了前馈补偿和反馈补偿实验。施加复合三角波信号后，压电驱动器的平均绝对位移误差为0.1192μm，均方误差为0.2949μm。结果表明，MPI模型对二维压电定位平台的滞后具有有效的补偿作用。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/7be7/8874454/b90db2c8d2a2/micromachines-13-00321-g014.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/7be7/8874454/a5e80bc612ae/micromachines-13-00321-g001.jpg
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https://cdn.ncbi.nlm.nih.gov/pmc/blobs/7be7/8874454/8cbe68ab5955/micromachines-13-00321-g005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/7be7/8874454/e389c568911f/micromachines-13-00321-g006.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/7be7/8874454/fbad334b9909/micromachines-13-00321-g007a.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/7be7/8874454/ef2764003d0c/micromachines-13-00321-g008.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/7be7/8874454/2ac80065bc7b/micromachines-13-00321-g009.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/7be7/8874454/af9a288911ef/micromachines-13-00321-g010a.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/7be7/8874454/3ce2ce63a793/micromachines-13-00321-g011.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/7be7/8874454/7638ff90b0e8/micromachines-13-00321-g012.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/7be7/8874454/960d7fba460a/micromachines-13-00321-g013.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/7be7/8874454/b90db2c8d2a2/micromachines-13-00321-g014.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/7be7/8874454/a5e80bc612ae/micromachines-13-00321-g001.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/7be7/8874454/77ad8d627082/micromachines-13-00321-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/7be7/8874454/383c27d0040b/micromachines-13-00321-g003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/7be7/8874454/b690ff3675c9/micromachines-13-00321-g004a.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/7be7/8874454/8cbe68ab5955/micromachines-13-00321-g005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/7be7/8874454/e389c568911f/micromachines-13-00321-g006.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/7be7/8874454/fbad334b9909/micromachines-13-00321-g007a.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/7be7/8874454/ef2764003d0c/micromachines-13-00321-g008.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/7be7/8874454/2ac80065bc7b/micromachines-13-00321-g009.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/7be7/8874454/af9a288911ef/micromachines-13-00321-g010a.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/7be7/8874454/3ce2ce63a793/micromachines-13-00321-g011.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/7be7/8874454/7638ff90b0e8/micromachines-13-00321-g012.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/7be7/8874454/960d7fba460a/micromachines-13-00321-g013.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/7be7/8874454/b90db2c8d2a2/micromachines-13-00321-g014.jpg

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Micromachines (Basel). 2021 Aug 10;12(8):942. doi: 10.3390/mi12080942.
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A Compound Control Based on the Piezo-Actuated Stage with Bouc-Wen Model.
一种基于带有布坎南模型的压电驱动平台的复合控制。
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