Wu Si-Si, Huang Teng-Xiang, Xu Xiaolan, Bao Yi-Fan, Pei Xin-Di, Yao Xu, Cao Mao-Feng, Lin Kai-Qiang, Wang Xiang, Wang Dongdong, Ren Bin
State Key Laboratory of Physical Chemistry of Solid Surfaces, Collaborative Innovation Center of Chemistry for Energy Materials (iChEM), Tan Kah Kee Innovation Laboratory, MOE Key Laboratory of Spectrochemical Analysis and Instrumentation, College of Chemistry and Chemical Engineering, Xiamen University, Xiamen 361005, China.
Department of Civil Engineering, Xiamen University, Xiamen 361005, China.
ACS Nano. 2022 Mar 22;16(3):4786-4794. doi: 10.1021/acsnano.2c00096. Epub 2022 Feb 28.
Defects can locally tailor the electronic properties of 2D materials, including the band gap and electron density, and possess the merit for optical and electronic applications. However, it is still a great challenge to realize rational defect engineering, which requires quantitative study of the effect of defects on electronic properties under ambient conditions. In this work, we employed tip-enhanced photoluminescence (TEPL) spectroscopy to obtain the PL spectra of different defects (wrinkle and edge) in mechanically exfoliated thin-layer transition metal dichalcogenides (TMDCs) with nanometer spatial resolution. We quantitatively obtained the band gap and electron density at defects by analyzing the wavelength and intensity ratio of excitons and trions. We further visualized the strain distribution across a wrinkle and the edge-induced reconstructive regions of the band gap and electron density by TEPL line scans. The doping effect on the Fermi level and optical performance was unveiled through comparative studies of edges on TMDC monolayers of different doping types. These quantitative results are vital to guide defect engineering and design and fabrication of TMDC-based optoelectronics devices.
缺陷能够局部地调整二维材料的电子特性,包括带隙和电子密度,并且具有在光学和电子应用方面的优势。然而,实现合理的缺陷工程仍然是一个巨大的挑战,这需要在环境条件下对缺陷对电子特性的影响进行定量研究。在这项工作中,我们采用针尖增强光致发光(TEPL)光谱,以纳米空间分辨率获得机械剥离的薄层过渡金属二硫属化物(TMDCs)中不同缺陷(皱纹和边缘)的PL光谱。通过分析激子和三重子的波长和强度比,我们定量地获得了缺陷处的带隙和电子密度。通过TEPL线扫描,我们进一步可视化了皱纹上的应变分布以及带隙和电子密度的边缘诱导重构区域。通过对不同掺杂类型的TMDC单层边缘的比较研究,揭示了掺杂对费米能级和光学性能的影响。这些定量结果对于指导缺陷工程以及基于TMDC的光电器件的设计和制造至关重要。