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氢卤酸处理增强单层 MoSe2 的光致发光及修复其结构。

Photoluminescence Enhancement and Structure Repairing of Monolayer MoSe2 by Hydrohalic Acid Treatment.

机构信息

Physical Sciences and Engineering Division, King Abdullah University of Science and Technology , Thuwal, 23955-6900, Saudi Arabia.

Research Center for Applied Sciences , 128 Sec. 2, Academia Road, Nankang, Taipei 11529, Taiwan.

出版信息

ACS Nano. 2016 Jan 26;10(1):1454-61. doi: 10.1021/acsnano.5b06960. Epub 2016 Jan 5.

Abstract

Atomically thin two-dimensional transition-metal dichalcogenides (TMDCs) have attracted much attention recently due to their unique electronic and optical properties for future optoelectronic devices. The chemical vapor deposition (CVD) method is able to generate TMDCs layers with a scalable size and a controllable thickness. However, the TMDC monolayers grown by CVD may incorporate structural defects, and it is fundamentally important to understand the relation between photoluminescence and structural defects. In this report, point defects (Se vacancies) and oxidized Se defects in CVD-grown MoSe2 monolayers are identified by transmission electron microscopy and X-ray photoelectron spectroscopy. These defects can significantly trap free charge carriers and localize excitons, leading to the smearing of free band-to-band exciton emission. Here, we report that the simple hydrohalic acid treatment (such as HBr) is able to efficiently suppress the trap-state emission and promote the neutral exciton and trion emission in defective MoSe2 monolayers through the p-doping process, where the overall photoluminescence intensity at room temperature can be enhanced by a factor of 30. We show that HBr treatment is able to activate distinctive trion and free exciton emissions even from highly defective MoSe2 layers. Our results suggest that the HBr treatment not only reduces the n-doping in MoSe2 but also reduces the structural defects. The results provide further insights of the control and tailoring the exciton emission from CVD-grown monolayer TMDCs.

摘要

原子层厚的二维过渡金属二卤化物(TMDCs)由于其独特的电子和光学性质,在未来的光电器件中引起了广泛关注。化学气相沉积(CVD)方法能够生成具有可扩展尺寸和可控厚度的 TMDC 层。然而,CVD 生长的 TMDC 单层可能会包含结构缺陷,因此了解光致发光与结构缺陷之间的关系至关重要。在本报告中,通过透射电子显微镜和 X 射线光电子能谱,鉴定了 CVD 生长的 MoSe2 单层中的点缺陷(硒空位)和氧化硒缺陷。这些缺陷可以显著捕获自由电荷载流子并局域激子,导致自由带间激子发射的展宽。在这里,我们报告简单的卤酸处理(如 HBr)能够通过 p 掺杂过程有效地抑制缺陷 MoSe2 单层中的陷阱态发射,并促进中性激子和三重子发射,其中室温下的整体光致发光强度可以增强 30 倍。我们表明,即使在高度缺陷的 MoSe2 层中,HBr 处理也能够激活独特的三重子和自由激子发射。我们的结果表明,HBr 处理不仅减少了 MoSe2 中的 n 掺杂,而且还减少了结构缺陷。这些结果为控制和调整 CVD 生长的单层 TMDC 的激子发射提供了进一步的见解。

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