Feng Liang-Ying, Villaos Rovi Angelo B, Maghirang Aniceto B, Huang Zhi-Quan, Hsu Chia-Hsiu, Lin Hsin, Chuang Feng-Chuan
Department of Physics, National Sun Yat-Sen University, 70 Lienhai Rd., Kaohsiung, 80424, Taiwan.
Physics Division, National Center for Theoretical Sciences, Taipei, 10617, Taiwan.
Sci Rep. 2022 Mar 17;12(1):4582. doi: 10.1038/s41598-022-08370-2.
Topological Dirac materials are attracting a lot of attention because they offer exotic physical phenomena. An exhaustive search coupled with first-principles calculations was implemented to investigate 10 Zintl compounds with a chemical formula of CaMX (M = Zn or Cd, X = N, P, As, Sb, or Bi) under three crystal structures: CaAlSi-, ThCrSi-, and BaCuS-type crystal phases. All of the materials were found to energetically prefer the CaAlSi-type structure based on total ground state energy calculations. Symmetry-based indicators are used to evaluate their topological properties. Interestingly, we found that CaMBi (M = Zn or Cd) are topological crystalline insulators. Further calculations under the hybrid functional approach and analysis using k · p model reveal that they exhibit topological Dirac semimetal (TDSM) states, where the four-fold degenerate Dirac points are located along the high symmetry line in-between Г to A points. These findings are verified through Green's function surface state calculations under HSE06. Finally, phonon spectra calculations revealed that CaCdBi is thermodynamically stable. The Zintl phase of AMX compounds have not been identified in any topological material databases, thus can be a new playground in the search for new topological materials.
拓扑狄拉克材料因其呈现出奇异的物理现象而备受关注。我们通过详尽的搜索并结合第一性原理计算,对10种化学式为CaMX(M = Zn或Cd,X = N、P、As、Sb或Bi)的津特耳化合物在三种晶体结构下进行了研究:CaAlSi型、ThCrSi型和BaCuS型晶相。基于总基态能量计算,发现所有材料在能量上都更倾向于CaAlSi型结构。我们使用基于对称性的指标来评估它们的拓扑性质。有趣的是,我们发现CaMBi(M = Zn或Cd)是拓扑晶体绝缘体。在杂化泛函方法下的进一步计算以及使用k·p模型的分析表明,它们呈现出拓扑狄拉克半金属(TDSM)态,其中四重简并狄拉克点位于Г点到A点之间的高对称线上。这些发现通过在HSE06下的格林函数表面态计算得到了验证。最后,声子谱计算表明CaCdBi在热力学上是稳定的。AMX化合物的津特耳相在任何拓扑材料数据库中都未被识别,因此可以成为寻找新型拓扑材料的新领域。