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基于光刻技术制作由 ZnO/Ag/ZnO 薄膜构成的具有二维周期性孔的光子结构的方案。

Protocol for fabricating a photonic structure consisting of ZnO/Ag/ZnO film perforated with 2D periodic apertures based on photolithography technology.

机构信息

Department of Thermal Science and Energy Engineering, University of Science and Technology of China (USTC), Hefei 230027, People's Republic of China.

USTC Center for Micro and Nanoscale Research and Fabrication, Hefei 230027, People's Republic of China.

出版信息

STAR Protoc. 2022 Mar 15;3(2):101242. doi: 10.1016/j.xpro.2022.101242. eCollection 2022 Jun 17.

Abstract

A ZnO/Ag/ZnO film with 2D periodic apertures can have a high visible transmittance and low emittances in atmospheric windows for visible-infrared compatible camouflage and a high transmittance in 5-8 m for heat dissipation by radiation. This following protocol details the fabrication process of such a photonic structure based on photolithography technology. Also described are the related challenges and troubleshooting steps. For complete details on the use and execution of this protocol, please refer to Dang and Ye (2021).

摘要

具有二维周期性孔径的 ZnO/Ag/ZnO 薄膜在可见光-红外兼容伪装的大气窗口中具有高可见光透过率和低发射率,在 5-8 m 范围内具有高透过率,可通过辐射散热。本方案详细介绍了基于光刻技术的这种光子结构的制造工艺。还描述了相关的挑战和故障排除步骤。有关本方案使用和执行的完整详细信息,请参阅 Dang 和 Ye(2021)。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/bd9b/8931432/13546a19daa7/fx1.jpg

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