Preparation of Ni micropillar arrays with high aspect ratios using anodic porous alumina template and their application to molds for imprinting.

Anodic porous alumina templates with controlled microscale geometrical structures were prepared by a process combining mask formation and subsequent selective etching of the alumina layer. In this process, the anisotropic etching of anodic porous alumina allows the preparation of anodic porous alumina with microhole array patterns having high aspect ratios. The electrodeposition of Ni using the obtained alumina templates generated an array of Ni micropillars with high aspect ratios. The height of Ni micropillars could also be controlled by adjusting the thickness of the anodic porous alumina. The obtained Ni micropillar array with a high aspect ratio was applied as a mold for imprinting. The ordered microstructures of TiO with high aspect ratios were prepared by imprinting using the Ni mold.