Yanagishita Takashi, Otsuka Masaya, Takei Takashi, Uto Seigo, Masuda Hideki
Department of Applied Chemistry, Tokyo Metropolitan University, 1-1 Minamiosawa, Hachioji, Tokyo 192-0397, Japan.
Langmuir. 2021 Jul 13;37(27):8331-8338. doi: 10.1021/acs.langmuir.1c01176. Epub 2021 Jun 29.
Ordered anodic porous alumina with controlled-size holes on the order of a single-nanometer scale was obtained by the atomic layer deposition (ALD) of AlO or TiO. The thin metal oxide layers of uniform thickness were formed successfully on the inner wall of the hole of the ordered anodic porous alumina with high aspect ratios by ALD. The hole diameter of the ordered anodic porous alumina could be controlled precisely by adjusting the number of cycles of ALD. The obtained anodic porous alumina with an ordered hole arrangement of reduced holes will be applied to various application fields requiring uniform-sized holes on the order of a single-nanometer scale, such as the starting material for preparing various types of quantum effect devices.
通过AlO或TiO的原子层沉积（ALD）获得了具有单纳米尺度可控尺寸孔洞的有序阳极多孔氧化铝。通过ALD成功地在具有高纵横比的有序阳极多孔氧化铝的孔内壁上形成了均匀厚度的薄金属氧化物层。通过调整ALD的循环次数，可以精确控制有序阳极多孔氧化铝的孔径。所获得的具有有序孔洞排列且孔洞减少的阳极多孔氧化铝将应用于各种需要单纳米尺度均匀尺寸孔洞的应用领域，例如制备各种类型量子效应器件的起始材料。
