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真空退火和空气退火对用于光伏和光电子应用的多层CdZnS薄膜的结构、形态、光学和电学性质的影响

Effects of Vacuum and Air Annealing on Structural, Morphological, Optical, and Electrical Properties of Multilayer CdZnS Thin Films for Photovoltaic and Optoelectronic Applications.

作者信息

Bashir Khalid, Mehboob Nasir, Ashraf Muhammad, Zaman Abid, Tirth Vineet, Algahtani Ali, Ali Asad, Ali Turab, Mushtaq Muhammad, Althubeiti Khaled

机构信息

Department of Physics, Riphah International University, Islamabad 44000, Pakistan.

Optics Laboratories, P.O. Box 1021, Islamabad 44000, Pakistan.

出版信息

ACS Omega. 2022 Apr 5;7(15):12937-12946. doi: 10.1021/acsomega.2c00212. eCollection 2022 Apr 19.

DOI:10.1021/acsomega.2c00212
PMID:35474789
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC9026001/
Abstract

Multilayer CdZnS (CZS) thin film was deposited on soda lime glass substrates. After deposition, the films were vacuum and air annealed at 100 °C, 200 °C, 300 and 400 °C for 1 h. Effects of vacuum and air annealing on structural, morphological, optical, and electrical properties of multilayer CZS films with increasing annealing temperature (IAT) were studied. The structural analysis revealed that the films were polycrystalline with hexagonal structure having a prominent/intensive peak along the (002) plane at 300 and 400 °C. The crystallite size of nanoparticles increased from 18.4 to 20.5 nm under air annealing and from 18.4 to 26.9 nm under vacuum annealing, showing the significance of annealing on nanoparticle grain growth. According to morphological analysis, the multilayer technique provides homogeneous film distribution over the substrate. The transmittance graphs of films revealed that it increased up to 92% in the visible and NIR regions under vacuum annealing and up to 52% under air annealing. Vacuum annealing enhanced the band gap energies more significantly than air annealing. The electrical resistivity increased with IAT, showing that structural, morphological, optical, and electrical properties of the multilayer thin films of CZS were strongly dependent on vacuum and air annealing.

摘要

在钠钙玻璃基板上沉积了多层硫化镉锌(CZS)薄膜。沉积后,将薄膜在100℃、200℃、300℃和400℃下进行真空退火和空气退火1小时。研究了真空退火和空气退火对多层CZS薄膜结构、形态、光学和电学性能随退火温度升高(IAT)的影响。结构分析表明,薄膜为多晶结构,具有六方结构,在300℃和400℃时沿(002)平面有一个突出/强烈的峰。空气退火下纳米颗粒的晶粒尺寸从18.4nm增加到20.5nm,真空退火下从18.4nm增加到26.9nm,表明退火对纳米颗粒晶粒生长具有重要意义。根据形态分析,多层技术在基板上提供了均匀的薄膜分布。薄膜的透过率曲线表明,在真空退火下,可见光和近红外区域的透过率提高到92%,在空气退火下提高到52%。真空退火比空气退火更显著地提高了带隙能量。电阻率随IAT增加,表明CZS多层薄膜的结构、形态、光学和电学性能强烈依赖于真空退火和空气退火。

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