Majhi Arindam, Nayak Maheswar, Pradhan Paresh Chandra, Jena Suvendu, Gome Anil, Singh Manvendra Narayan, Srivastava Himanshu, Reddy Varimalla Raghvendra, Srivastava Arvind Kumar, Sinha Anil Kumar, Udupa Dinesh Venkatesh, Pietsch Ullrich
Synchrotrons Utilization Section, Raja Ramanna Centre for Advanced Technology Indore 452013 India
Homi Bhabha National Institute Anushakti Nagar Mumbai 400094 India.
RSC Adv. 2021 Aug 19;11(45):28097-28105. doi: 10.1039/d1ra04412e. eCollection 2021 Aug 16.
The present finding illuminates the physics of the formation of interfaces of metal based hetero-structures near layer continuous limit as an approach to develop high-efficiency W/BC multilayer (ML) optics with ML periodicity varying = 1.86-1.23 nm at a fixed number of layer pairs = 400. The microstructure of metal layers is tailored near the onset of grain growth to control the surface density of grains resulting in small average sizes of grains to sub-nanometers. This generates concurrently desirable atomically sharp interfaces, high optical contrast, and desirable stress properties over a large number of periods, which have evidence through the developed ML optics. We demonstrate significantly high reflectivities of ML optics measured in the energy range 10-20 keV, except for = 1.23 nm due to quasi-continuous layers. The reflectivities at soft gamma-rays are predicted.
目前的研究结果阐明了在层连续极限附近金属基异质结构界面形成的物理过程,这是一种开发高效W/BC多层(ML)光学器件的方法,在固定层数对N = 400时,ML周期在Λ = 1.86 - 1.23 nm之间变化。金属层的微观结构在晶粒生长开始时进行调整,以控制晶粒的表面密度,从而使晶粒的平均尺寸小至亚纳米级。这同时产生了所需的原子级尖锐界面、高光学对比度以及在大量周期内所需的应力特性,这些都通过所开发的ML光学器件得到了证实。我们展示了在10 - 20 keV能量范围内测量的ML光学器件具有显著的高反射率,但由于准连续层,Λ = 1.23 nm时除外。还预测了软伽马射线的反射率。