Zhang Kaining, Li Nan
State Key Laboratory of Explosion Science and Technology, School of Mechatronical Engineering, Beijing Institute of Technology Beijing 100081 P. R. China
RSC Adv. 2020 Apr 8;10(24):14225-14234. doi: 10.1039/d0ra00964d. eCollection 2020 Apr 6.
Recently, two-dimensional semiconductor materials with moderate band gaps and significant light absorption have been highly sought for application in photocatalysis and nanoelectronics. In this study, novel monolayer SiN and GeN have been predicted by using first-principles calculations. They have excellent thermal and dynamic stabilities and present indirect band gaps of 2.58 eV and 2.21 eV with anisotropic carrier mobility, respectively. Suitable band gaps and band edges of SiN and GeN indicate that they can simultaneously produce both hydrogen and oxygen in the pH range of 6 to 14 and 0 to 10, respectively. Theoretical studies on strain engineering show that their band gaps could be effectively tuned by both biaxial tensile and compressive strain. Our work enriches the family of two-dimensional semiconductor materials and shows that monolayer SiN and GeN are promising candidates for electronic devices and photocatalysis.
最近,具有适度带隙和显著光吸收特性的二维半导体材料在光催化和纳米电子学领域的应用中备受青睐。在本研究中,通过第一性原理计算预测了新型单层SiN和GeN。它们具有出色的热稳定性和动力学稳定性,分别呈现出2.58 eV和2.21 eV的间接带隙以及各向异性的载流子迁移率。SiN和GeN合适的带隙和带边表明,它们分别可以在pH值为6至14和0至10的范围内同时产生氢气和氧气。应变工程的理论研究表明,双轴拉伸和压缩应变均可有效调节它们的带隙。我们的工作丰富了二维半导体材料家族,并表明单层SiN和GeN是电子器件和光催化领域很有前景的候选材料。