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用于铁电应用的亚稳单斜[110]层状钙钛矿DyTiO薄膜。

Metastable monoclinic [110] layered perovskite DyTiO thin films for ferroelectric applications.

作者信息

Pravarthana D, Lebedev O I, David A, Fouchet A, Trassin M, Rohrer G S, Salvador P A, Prellier W

机构信息

CAS Key Laboratory of Magnetic Materials and Devices, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences Ningbo 315201 People's Republic of China

Laboratoire CRISMAT, CNRS UMR 6508, ENSICAEN, Normandie Université 6 Bd Maréchal Juin F-14050 Caen Cedex 4 France

出版信息

RSC Adv. 2019 Jun 25;9(35):19895-19904. doi: 10.1039/c9ra04554f.

DOI:10.1039/c9ra04554f
PMID:35514740
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC9065425/
Abstract

Using the Combinatorial Substrate Epitaxy (CSE) approach, we report the stabilization of DyTiO epitaxial monoclinic, layered-perovskite phase DyTiO thin films. To achieve this, the films are deposited on high density, polished LaTiO polycrystalline ceramic substrates, which are stable as monoclinic layered-perovskites, and were prepared by conventional sintering. Microstructural analysis using electron backscatter diffraction (EBSD), electron diffraction (ED), and high-resolution transmission electron microscopy (HRTEM) support this observation. Further, they reveal that the cubic pyrochlore phase is observed far from the interface as films are grown thicker (100 nm), confirming the importance of substrate-induced phase and space group selection. This works reinforces the vast potential of CSE to promote the stabilization of metastable phases, thus giving access to new functional oxide materials, across a range of novel material systems including ferroelectrics.

摘要

我们采用组合衬底外延(CSE)方法,报道了DyTiO外延单斜层状钙钛矿相DyTiO薄膜的稳定化。为此,将薄膜沉积在高密度、经过抛光的LaTiO多晶陶瓷衬底上,该衬底作为单斜层状钙钛矿是稳定的,并且是通过传统烧结制备的。使用电子背散射衍射(EBSD)、电子衍射(ED)和高分辨率透射电子显微镜(HRTEM)进行的微观结构分析支持了这一观察结果。此外,他们还发现,随着薄膜生长得更厚(100纳米),在远离界面处观察到立方烧绿石相,这证实了衬底诱导的相和空间群选择的重要性。这项工作强化了CSE在促进亚稳相稳定化方面的巨大潜力,从而能够在包括铁电体在内的一系列新型材料体系中获得新的功能氧化物材料。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/1c59/9065425/356e74e3ec7d/c9ra04554f-f6.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/1c59/9065425/5e8509ae9e38/c9ra04554f-f1.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/1c59/9065425/b8e3cd031834/c9ra04554f-f2.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/1c59/9065425/d1f518ca2682/c9ra04554f-f3.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/1c59/9065425/b5a209cf945e/c9ra04554f-f4.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/1c59/9065425/64338b83803c/c9ra04554f-f5.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/1c59/9065425/356e74e3ec7d/c9ra04554f-f6.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/1c59/9065425/5e8509ae9e38/c9ra04554f-f1.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/1c59/9065425/b8e3cd031834/c9ra04554f-f2.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/1c59/9065425/d1f518ca2682/c9ra04554f-f3.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/1c59/9065425/b5a209cf945e/c9ra04554f-f4.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/1c59/9065425/64338b83803c/c9ra04554f-f5.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/1c59/9065425/356e74e3ec7d/c9ra04554f-f6.jpg

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本文引用的文献

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The origin of local strain in highly epitaxial oxide thin films.高度外延氧化物薄膜中局部应变的起源。
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