Frenzel Peter, Preuß Andrea, Bankwitz Jörn, Georgi Colin, Ganss Fabian, Mertens Lutz, Schulz Stefan E, Hellwig Olav, Mehring Michael, Lang Heinrich
Technische Universität Chemnitz, Faculty of Natural Sciences, Institute of Chemistry, Inorganic Chemistry D-09107 Chemnitz Germany
Fraunhofer Institute for Electronic Nano Systems (ENAS), Technologie-Campus 3 D-09126 Chemnitz Germany.
RSC Adv. 2019 Apr 5;9(19):10657-10669. doi: 10.1039/c9ra00585d. eCollection 2019 Apr 3.
The synthesis of complexes [M(OCHMeCHNMeCH)] (5, M = Mg; 7, M = Zn) is described. Treatment of MeHNCHCHNMeH (1) with 2-methyloxirane (2) gave diol (HOCHMeCHNMeCH) (3), which upon reaction with equimolar amounts of MR (4, M = Mg, R = Bu; 6, M = Zn, R = Et) gave 5 and 7. The thermal behavior and vapor pressure of 5 and 7 were investigated to show whether they are suited as CVD (= chemical vapor deposition) and/or spin-coating precursors for MgO or ZnO layer formation. Thermogravimetric (TG) studies revealed that 5 and 7 decompose between 80-530 °C forming MgO and ZnO as evidenced by PXRD studies. In addition, TG-MS-coupled experiments were carried out with 7 proving that decomposition occurs by M-O, C-O, C-N and C-C bond cleavages, as evidenced from the detection of fragments such as CHN, CHN, CHN, CHO, CHO and CHO. The vapor pressure of 7 was measured at 10.4 mbar at 160 °C, while 5 is non-volatile. The layers obtained by CVD are dense and conformal with a somewhat granulated surface morphology as evidenced by SEM studies. In addition, spin-coating experiments using 5 and 7 as precursors were applied. The corresponding MO layer thicknesses are between 7-140 nm (CVD) or 80 nm and 65 nm (5, 7; spin-coating). EDX and XPS measurements confirm the formation of MgO and ZnO films, however, containing 12-24 mol% (CVD) or 5-9 mol% (spin-coating) carbon. GIXRD studies verify the crystalline character of the deposited layers obtained by CVD and the spin-coating processes.
本文描述了配合物[M(OCHMeCHNMeCH)](5,M = Mg;7,M = Zn)的合成。用2 - 甲基环氧乙烷(2)处理MeHNCHCHNMeH(1)得到二醇(HOCHMeCHNMeCH)(3),其与等摩尔量的MR(4,M = Mg,R = Bu;6,M = Zn,R = Et)反应得到5和7。研究了5和7的热行为及蒸气压,以确定它们是否适合作为用于形成MgO或ZnO层的化学气相沉积(CVD)和/或旋涂前驱体。热重(TG)研究表明,5和7在80 - 530℃之间分解形成MgO和ZnO,粉末X射线衍射(PXRD)研究证实了这一点。此外,对7进行了TG - MS联用实验,证明分解是通过M - O、C - O、C - N和C - C键的断裂发生的,检测到的碎片如CHN、CHN、CHN、CHO、CHO和CHO证明了这一点。7在160℃时的蒸气压为10.4毫巴,而5是不挥发的。扫描电子显微镜(SEM)研究表明,通过CVD获得的层致密且保形,表面形态有点粒状。此外,还进行了使用5和7作为前驱体的旋涂实验。相应的MO层厚度在7 - 140纳米(CVD)或80纳米至65纳米之间(5,7;旋涂)。能量色散X射线光谱(EDX)和X射线光电子能谱(XPS)测量证实了MgO和ZnO薄膜的形成,然而,薄膜含有12 - 24摩尔%(CVD)或5 - 9摩尔%(旋涂)的碳。掠入射X射线衍射(GIXRD)研究验证了通过CVD和旋涂工艺获得的沉积层的晶体特性。