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在硅衬底上对一种无任何中性层的新型高嵌段共聚物垂直自组装的研究。

Study of the perpendicular self-assembly of a novel high- block copolymer without any neutral layer on a silicon substrate.

作者信息

Zhang Baolin, Liu Weichen, Meng Lingkuan, Zhang Zhengping, Zhang Libin, Wu Xing, Dai Junyan, Mao Guoping, Wei Yayi

机构信息

College of Big Data and Information Engineering, Guizhou University Guiyang 550025 P. R. China.

Integrated Circuit Advanced Process Center (ICAC), Institute of Microelectronics of Chinese Academy of Sciences (IME CAS) Beijing 100029 P. R. China

出版信息

RSC Adv. 2019 Jan 29;9(7):3828-3837. doi: 10.1039/c8ra10319d. eCollection 2019 Jan 25.

DOI:10.1039/c8ra10319d
PMID:35518108
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC9060441/
Abstract

A novel type of high- block copolymer, polystyrene--polycarbonate (PS--PC), which contains an active -NH- group on the polymer backbone between the PS block and the PC block, has been successfully synthesized. Vertical micro-phase separation can be successfully achieved on Si substrates with neutral-layer-free materials with a pitch of 16.8 nm. Water contact angle experiments indicate that PS and PC have approximate surface energy values on Si substrates. A hydrogen bond mechanism has been proposed for the formation of a periodic and lamella-forming phase separation structure, with the domains oriented perpendicular to the substrate. A combination of both theory and experimental verification proves that the hydrogen bonding plays a dominant role as a real driving force to promote vertical micro-phase separation in the absence of a neutral layer. Subsequently, the study of a novel block copolymer on four different types of substrate without any neutral layer further confirms that the newly synthesized material enables greater flexibility and potential applications for the fabrication of various nanostructures and functional electronic devices in a simple, cost-effective and efficient way, which is of considerable importance to contemporary and emerging technology applications.

摘要

一种新型的高嵌段共聚物,聚苯乙烯 - 聚碳酸酯(PS - PC)已成功合成,该共聚物在PS嵌段和PC嵌段之间的聚合物主链上含有一个活性 -NH- 基团。在具有16.8 nm间距的无中性层材料的硅衬底上可以成功实现垂直微相分离。水接触角实验表明,PS和PC在硅衬底上具有近似的表面能值。已提出一种氢键机制,用于形成周期性的层状相分离结构,其畴垂直于衬底取向。理论与实验验证相结合证明,在没有中性层的情况下,氢键作为促进垂直微相分离的真正驱动力起着主导作用。随后,对四种不同类型无任何中性层的衬底上的新型嵌段共聚物的研究进一步证实,新合成的材料能够以简单、经济高效的方式为各种纳米结构和功能电子器件的制造提供更大的灵活性和潜在应用,这对当代和新兴技术应用具有相当重要的意义。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/82e0/9060441/2bab20460fed/c8ra10319d-f9.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/82e0/9060441/43a66d37559e/c8ra10319d-f1.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/82e0/9060441/069c8225e22b/c8ra10319d-f2.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/82e0/9060441/8bc85067a4d9/c8ra10319d-f3.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/82e0/9060441/02b7e31b15db/c8ra10319d-f4.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/82e0/9060441/c22720b2ffc9/c8ra10319d-f5.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/82e0/9060441/c4e8b1519695/c8ra10319d-f6.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/82e0/9060441/874666d56429/c8ra10319d-f7.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/82e0/9060441/b2c90af0e0ed/c8ra10319d-f8.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/82e0/9060441/2bab20460fed/c8ra10319d-f9.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/82e0/9060441/43a66d37559e/c8ra10319d-f1.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/82e0/9060441/069c8225e22b/c8ra10319d-f2.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/82e0/9060441/8bc85067a4d9/c8ra10319d-f3.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/82e0/9060441/02b7e31b15db/c8ra10319d-f4.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/82e0/9060441/c22720b2ffc9/c8ra10319d-f5.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/82e0/9060441/c4e8b1519695/c8ra10319d-f6.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/82e0/9060441/874666d56429/c8ra10319d-f7.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/82e0/9060441/b2c90af0e0ed/c8ra10319d-f8.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/82e0/9060441/2bab20460fed/c8ra10319d-f9.jpg

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本文引用的文献

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Self-Assembled Nanofeatures in Complex Three-Dimensional Topographies via Nanoimprint and Block Copolymer Lithography Methods.通过纳米压印和嵌段共聚物光刻方法在复杂三维形貌中实现的自组装纳米特征
ACS Omega. 2017 Aug 10;2(8):4417-4423. doi: 10.1021/acsomega.7b00781. eCollection 2017 Aug 31.
2
Surface-Initiated Polymerization for Amplification of Self-Assembled Monolayers Patterned by Microcontact Printing.用于扩增通过微接触印刷图案化的自组装单分子层的表面引发聚合反应。
Angew Chem Int Ed Engl. 1999 Mar 1;38(5):647-649. doi: 10.1002/(SICI)1521-3773(19990301)38:5<647::AID-ANIE647>3.0.CO;2-0.
3
Directed Self-Assembly of Polystyrene-b-poly(propylene carbonate) on Chemical Patterns via Thermal Annealing for Next Generation Lithography.
通过热退火在化学图案上定向自组装聚苯乙烯-b-聚(碳酸丙烯酯),用于下一代光刻技术。
Nano Lett. 2017 Feb 8;17(2):1233-1239. doi: 10.1021/acs.nanolett.6b05059. Epub 2017 Jan 27.
4
A Novel Nanofabrication Technique of Silicon-Based Nanostructures.一种基于硅的纳米结构的新型纳米制造技术。
Nanoscale Res Lett. 2016 Dec;11(1):504. doi: 10.1186/s11671-016-1702-4. Epub 2016 Nov 15.
5
A straightforward and CMOS-compatible nanofabrication technique of periodic SiO2 nanohole arrays.一种简单且与互补金属氧化物半导体(CMOS)兼容的周期性二氧化硅纳米孔阵列的纳米制造技术。
Nanotechnology. 2015 Oct 16;26(41):415303. doi: 10.1088/0957-4484/26/41/415303. Epub 2015 Sep 22.
6
A general design strategy for block copolymer directed self-assembly patterning of integrated circuits contact holes using an alphabet approach.采用字母法的集成电路接触孔嵌段共聚物定向自组装图形化的通用设计策略。
Nano Lett. 2015 Feb 11;15(2):805-12. doi: 10.1021/nl502172m. Epub 2015 Jan 8.
7
Two-dimensional pattern formation using graphoepitaxy of PS-b-PMMA block copolymers for advanced FinFET device and circuit fabrication.利用 PS-b-PMMA 嵌段共聚物的图形外延技术进行二维图案形成,用于先进 FinFET 器件和电路制造。
ACS Nano. 2014 May 27;8(5):5227-32. doi: 10.1021/nn501300b. Epub 2014 Apr 11.
8
Robust superhydrophobicity in large-area nanostructured surfaces defined by block-copolymer self assembly.由嵌段共聚物自组装定义的大面积纳米结构表面的强疏水性。
Adv Mater. 2014 Feb 12;26(6):886-91. doi: 10.1002/adma.201304006. Epub 2013 Oct 20.
9
Electrical biomolecule detection using nanopatterned silicon via block copolymer lithography.基于嵌段共聚物光刻技术的纳米图案化硅的电生物分子检测。
Small. 2014 Jan 29;10(2):337-43. doi: 10.1002/smll.201301202. Epub 2013 Jul 24.
10
Graphoepitaxy of block-copolymer self-assembly integrated with single-step ZnO nanoimprinting.嵌段共聚物自组装的图形化与一步法 ZnO 纳米压印集成。
Small. 2012 May 21;8(10):1563-9. doi: 10.1002/smll.201101960. Epub 2012 Feb 29.