Sharma Manisha, Nagar Rohit, Meena Vijay Kumar, Singh Suman
Central Scientific Instruments Organisation (CSIR-CSIO) Chandigarh India
Academy of Scientific and Innovative Research (AcSIR-CSIO) Ghaziabad India.
RSC Adv. 2019 Apr 9;9(20):11170-11178. doi: 10.1039/c9ra00811j.
Herein, nanoscale hydroxyapatite (HA) with a slab-like morphology was synthesized, and its size was calculated to be in the range of 80-150 nm, as confirmed scanning electron microscopy (SEM) and atomic force microscopy (AFM). The nanoscale HA with a slab-like structure has been referred as HA nanoslabs in the manuscript. The composition, crystallinity, wettability, bacterial resistance porosity, surface roughness and corrosion resistance of these HA nanoslabs were studied using energy dispersive spectroscopy (EDAX), X-ray diffraction (XRD), contact angle, colony count BET analyzer and profilometer and polarization techniques, respectively. The contact angle of the HA nanoslabs was found to be 22.6°, which indicated the hydrophilic nature of these nanoslabs. Their bacterial resistance was studied against the strain, and it was found that in the presence of the HA nanoslabs, the growth of the bacteria was hindered. For the corrosion resistance study, the HA nanoslabs were electro-deposited on a titanium alloy, used as a substrate. The deposition was carried out at varying currents, , 1 mA, 3 mA and 5 mA. The open circuit potential (OCP) and polarization were used for the estimation of the corrosion resistance of the bare and coated substrates. The corrosion potential started shifting towards noble potential, and the current density started decreasing with an increase in the electrochemical deposition current. This indicated good corrosion resistance of these nanoslabs.
在此,合成了具有板状形态的纳米级羟基磷灰石(HA),经扫描电子显微镜(SEM)和原子力显微镜(AFM)确认,其尺寸计算在80 - 150 nm范围内。在本文中,具有板状结构的纳米级HA被称为HA纳米片。分别使用能量色散光谱(EDAX)、X射线衍射(XRD)、接触角测量、菌落计数、BET分析仪、表面轮廓仪和极化技术研究了这些HA纳米片的组成、结晶度、润湿性、抗菌性、孔隙率、表面粗糙度和耐腐蚀性。发现HA纳米片的接触角为22.6°,这表明这些纳米片具有亲水性。研究了它们对该菌株的抗菌性,发现在存在HA纳米片的情况下,细菌的生长受到阻碍。为了进行耐腐蚀性研究,将HA纳米片电沉积在用作基底的钛合金上。沉积在不同电流,即0.5 mA、1 mA、3 mA和5 mA下进行。使用开路电位(OCP)和极化来评估裸基底和涂层基底的耐腐蚀性。随着电化学沉积电流的增加,腐蚀电位开始向正电位移动,电流密度开始降低。这表明这些纳米片具有良好的耐腐蚀性。