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钴磷涂层的耐磨性和耐腐蚀性:电流模式的影响。

Wear and corrosion resistance of Co-P coatings: the effects of current modes.

作者信息

Li Ruiqian, Hou Yuanyuan, Dong Qiujing, Su Peibo, Ju Pengfei, Liang Jun

机构信息

School of Chemistry and Materials Engineering, Fuyang Normal University Fuyang Anhui 236037 China.

State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences Lanzhou 730000 China

出版信息

RSC Adv. 2018 Jan 3;8(2):895-903. doi: 10.1039/c7ra10830c. eCollection 2018 Jan 2.

DOI:10.1039/c7ra10830c
PMID:35538951
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC9076975/
Abstract

In this work, Co-P coatings were deposited from a chloride-based bath by direct current (DC), pulse current (PC) and pulse reverse current (PRC) methods, respectively. The effects of current modes on the microstructure, composition, microhardness, wear resistance and corrosion resistance of the Co-P coatings were explored. Results showed that the P content in the Co-P coatings increased and the surface roughness decreased in the sequence of DC, PC and PRC methods. The coatings with low P content deposited by DC and PC methods are crystalline with fcc and hcp structures, respectively, while the coating with high P content deposited by the PRC method is amorphous. Comparing to DC and PC methods, the PRC method can evidently improve the microhardness, wear resistance and corrosion resistance of Co-P coatings. The excellent wear and corrosion resistance of the Co-P coatings deposited by the PRC method could be attributed to its high P content, smooth surface and amorphous structure.

摘要

在本工作中,分别通过直流(DC)、脉冲电流(PC)和脉冲反向电流(PRC)方法从氯化物基镀液中沉积Co-P涂层。探究了电流模式对Co-P涂层的微观结构、成分、显微硬度、耐磨性和耐腐蚀性的影响。结果表明,Co-P涂层中的P含量按直流、脉冲电流和脉冲反向电流方法的顺序增加,表面粗糙度降低。通过直流和脉冲电流方法沉积的低P含量涂层分别为具有面心立方(fcc)和六方密排(hcp)结构的晶体,而通过脉冲反向电流方法沉积的高P含量涂层为非晶态。与直流和脉冲电流方法相比,脉冲反向电流方法可显著提高Co-P涂层的显微硬度、耐磨性和耐腐蚀性。通过脉冲反向电流方法沉积的Co-P涂层优异的耐磨和耐腐蚀性能可归因于其高P含量、光滑表面和非晶态结构。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b911/9076975/e5230bf550b2/c7ra10830c-f12.jpg
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https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b911/9076975/268f4ecc0965/c7ra10830c-f6.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b911/9076975/61777e5b4060/c7ra10830c-f7.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b911/9076975/ae2d422a47a2/c7ra10830c-f8.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b911/9076975/987249998705/c7ra10830c-f9.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b911/9076975/ead8a35a93f3/c7ra10830c-f10.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b911/9076975/bc410f87a883/c7ra10830c-f11.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b911/9076975/e5230bf550b2/c7ra10830c-f12.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b911/9076975/ce0f52b5b556/c7ra10830c-f1.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b911/9076975/caeb8c15c1ba/c7ra10830c-f2.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b911/9076975/271003e5e4e4/c7ra10830c-f3.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b911/9076975/6717533aceeb/c7ra10830c-f4.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b911/9076975/cce2b517b5ee/c7ra10830c-f5.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b911/9076975/268f4ecc0965/c7ra10830c-f6.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b911/9076975/61777e5b4060/c7ra10830c-f7.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b911/9076975/ae2d422a47a2/c7ra10830c-f8.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b911/9076975/987249998705/c7ra10830c-f9.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b911/9076975/ead8a35a93f3/c7ra10830c-f10.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b911/9076975/bc410f87a883/c7ra10830c-f11.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b911/9076975/e5230bf550b2/c7ra10830c-f12.jpg

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