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Correction: EUV photofragmentation study of hybrid nonchemically amplified resists containing antimony as an absorption enhancer.更正：含锑作为吸收增强剂的混合非化学放大光刻胶的极紫外光光致碎裂研究。
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EUV photofragmentation study of hybrid nonchemically amplified resists containing antimony as an absorption enhancer.含锑作为吸收增强剂的混合非化学放大光刻胶的极紫外光光致碎裂研究。
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更正：含锑作为吸收增强剂的混合非化学放大光刻胶的极紫外光光致碎裂研究。

Correction: EUV photofragmentation study of hybrid nonchemically amplified resists containing antimony as an absorption enhancer.

作者信息

Moura Cleverson Alves da Silva, Belmonte Guilherme Kretzmann, Reddy Pulikanti Guruprasad, Gonsalves Kenneth E, Weibel Daniel Eduardo

机构信息

Department of Chemical Physics, Chemical Institute, UFRGS Porto Alegre 91501-970 RS Brazil

School of Basic Sciences, Indian Institute of Technology Mandi Mandi - 175001 Himachal Pradesh India.

出版信息

RSC Adv. 2018 Apr 20;8(27):15029. doi: 10.1039/c8ra90030b. eCollection 2018 Apr 18.

DOI:10.1039/c8ra90030b
PMID:35544017
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC9080001/
Abstract

[This corrects the article DOI: 10.1039/C7RA12934C.].

摘要

[本文更正了文章的数字对象标识符：10.1039/C7RA12934C。]