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通过苯乙烯基铋衍生物的自由基聚合合成具有高折射率和X射线屏蔽性能的含铋聚合物薄膜。

Synthesis of Bismuth-Containing Polymer Films with High Refractive Index and X-ray Shielding Property by Radical Polymerization of Styrylbismuthine Derivatives.

作者信息

Matsumura Yoshimasa, Horikoshi Hiroshi, Furukawa Kikuo, Miyamoto Miyuki, Nishimura Yoshio, Ochiai Bungo

机构信息

Graduate School of Science and Engineering, Yamagata University, 4-3-16 Jonan, Yonezawa, Yamagata 992-8510, Japan.

Mitsubishi Gas Chemical Company, Inc., 2-5-2 Marunouchi, Chiyoda-ku, Tokyo 100-8324, Japan.

出版信息

ACS Macro Lett. 2022 Jun 21;11(6):723-726. doi: 10.1021/acsmacrolett.2c00149. Epub 2022 May 16.

Abstract

Highly refractive and X-ray shielding polymer films were prepared by bulk radical copolymerization of diphenylstyrylbismuthine (MStBi) with tristyrylbismuthine (TStBi). For example, a yellow transparent film was obtained by copolymerization of MStBi and TStBi in a ratio of 70:30 (w/w). The refractive index () and radiopacity of the film of these polymers are 1.72 and 1.60 μm-Al/μm-polymer, respectively. These properties are higher than those of the reported bismuth-containing polymers. The thermal stability and flexural module of the polymer films were controllable by the feed ratio of TStBi. The polymer films also exhibited high surface hardness and solvent resistance due to the rigid and cross-linked structure. The chemical and thermal stability and higher refractive index and radiopacity of the polymers suggest the potential applications for X-ray shielding of optical materials with high refractive indices.

摘要

通过二苯基苯乙烯基铋(MStBi)与三苯乙烯基铋(TStBi)的本体自由基共聚制备了高折射和X射线屏蔽聚合物薄膜。例如,通过以70:30(w/w)的比例共聚MStBi和TStBi获得了黄色透明薄膜。这些聚合物薄膜的折射率()和射线不透性分别为1.72和1.60μm-Al/μm-聚合物。这些性能高于已报道的含铋聚合物。聚合物薄膜的热稳定性和弯曲模量可通过TStBi的进料比来控制。由于刚性和交联结构,聚合物薄膜还表现出高表面硬度和耐溶剂性。聚合物的化学和热稳定性以及更高的折射率和射线不透性表明其在高折射率光学材料的X射线屏蔽方面具有潜在应用。

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