基于联苯二酚与羧酸的逐步缩聚和自由基聚合的X射线屏蔽聚合物
X-Ray Shielding Polymer Based on Sequential Polycondensation of BiPh and Carboxylic Acids and Radical Polymerization.
作者信息
Ochiai Bungo, Kamiya Ryo, Matsumura Yoshimasa, Tanaka Hiroyasu, Ueda Hideki, Uera Kazuyoshi, Furukawa Kikuo, Nishimura Yoshio
机构信息
Graduate School of Science and Engineering, Yamagata University, Yonezawa 990-8510, Japan.
Department of Applied Chemistry, Faculty of Engineering, Osaka Institute of Technology, Osaka 535-8585, Japan.
出版信息
Polymers (Basel). 2025 Jan 8;17(2):134. doi: 10.3390/polym17020134.
Transparent X-ray shielding polymer films were developed by bulk photo copolymerization of in situ prepared bismuth carboxylate prepolymers with polymerizable exomethylene moieties and ,-dimethylacrylamide (DMAA). The bismuth-containing prepolymers were prepared via the polycondensation of BiPh, 2-octenylsuccinic acid (OSA), and itaconic acid (IA) bearing an exomethylene group for polymerization. OSA was a chain extender by intermolecular condensation and a stopper by intramolecular cyclization to inhibit cross-linkage. The resulting photocured films exhibit high visible-light transparency and high , reaching 1.57. The X-ray shielding ability increased with the bismuth content and reached an aluminum equivalent of 0.80.
通过原位制备的含羧基铋预聚物与带有可聚合亚甲基部分的聚合物以及N，N-二甲基丙烯酰胺（DMAA）进行本体光共聚，制备了透明的X射线屏蔽聚合物薄膜。含铋预聚物是通过BiPh、2-辛烯基琥珀酸（OSA）和带有用于聚合的亚甲基的衣康酸（IA）的缩聚反应制备的。OSA通过分子间缩合作为扩链剂，并通过分子内环化作为封端剂来抑制交联。所得的光固化薄膜具有高可见光透明度，并且μ值高达1.57。X射线屏蔽能力随铋含量的增加而提高，达到了相当于0.80铝的屏蔽能力。
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