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通过溶剂退火模拟嵌段共聚物薄膜中的缺陷减少

Simulation of Defect Reduction in Block Copolymer Thin Films by Solvent Annealing.

作者信息

Hur Su-Mi, Khaira Gurdaman S, Ramírez-Hernández Abelardo, Müller Marcus, Nealey Paul F, de Pablo Juan J

机构信息

Materials Science Division, Argonne National Laboratory, 9700 South Cass Avenue, Argonne, Illinois 60439, United States.

Institute for Molecular Engineering, The University of Chicago, Chicago, Illinois 60637, United States.

出版信息

ACS Macro Lett. 2015 Jan 20;4(1):11-15. doi: 10.1021/mz500705q. Epub 2014 Dec 11.

DOI:10.1021/mz500705q
PMID:35596395
Abstract

Solvent annealing provides an effective means to control the self-assembly of block copolymer (BCP) thin films. Multiple effects, including swelling, shrinkage, and morphological transitions, act in concert to yield ordered or disordered structures. The current understanding of these processes is limited; by relying on a theoretically informed coarse-grained model of block copolymers, a conceptual framework is presented that permits prediction and rationalization of experimentally observed behaviors. Through proper selection of several process conditions, it is shown that a narrow window of solvent pressures exists over which one can direct a BCP material to form well-ordered, defect-free structures.

摘要

溶剂退火提供了一种控制嵌段共聚物(BCP)薄膜自组装的有效方法。多种效应,包括溶胀、收缩和形态转变,共同作用以产生有序或无序结构。目前对这些过程的理解有限;通过依赖理论指导的嵌段共聚物粗粒化模型,提出了一个概念框架,该框架允许对实验观察到的行为进行预测和合理化。通过适当选择几个工艺条件,结果表明存在一个狭窄的溶剂压力窗口,在此窗口范围内可以引导BCP材料形成有序、无缺陷的结构。

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