Xu Wen-Cong, Liu Chengwei, Liang Shuofeng, Zhang Dachuan, Liu Yazhi, Wu Si
CAS Key Laboratory of Soft Matter Chemistry, Anhui Key Laboratory of Optoelectronic Science and Technology, Department of Polymer Science and Engineering, University of Science and Technology of China, Hefei, 230026, P. R. China.
Max Planck Institute for Polymer Research, Ackermannweg 10, 55128, Mainz, Germany.
Adv Mater. 2022 Aug;34(31):e2202150. doi: 10.1002/adma.202202150. Epub 2022 Jun 28.
The fabrication of dual-mode patterns in the same region of a material is a promising approach for high-density information storage, new anti-counterfeiting technologies, and highly secure encryption. However, dual-mode patterns are difficult to achieve because the two patterns in one material may interfere with each other during fabrication and usage. The development of noninterfering dual-mode patterns requires new materials and patterning techniques. Herein, a novel orthogonal photopatterning technique is reported for the fabrication of noninterfering dual-mode patterns on an azopolymer P1. P1 is a unique material that exhibits both photoinduced reversible solid-to-liquid transitions and good stretchability. In the first step of orthogonal photopatterning, patterned photonic structures are fabricated on a P1 film via masked nanoimprinting controlled by photoinduced reversible solid-to-liquid transitions. In the second step, the P1 film is stretched and irradiated with polarized light through a photomask, which generates a chromatic polarization pattern. In particular, the photonic structures and chromatic polarization in the dual-mode pattern are noninterfering. Another feature of dual-mode patterns is that they are rewritable via photo-, thermal, or solution reprocessing, which are useful for recycling and reprogramming. This study opens an avenue for the development of novel materials and techniques for photopatterning.
在材料的同一区域制造双模图案是一种用于高密度信息存储、新型防伪技术和高安全性加密的有前途的方法。然而，双模图案很难实现，因为一种材料中的两种图案在制造和使用过程中可能会相互干扰。开发不相互干扰的双模图案需要新型材料和图案化技术。在此，报道了一种新颖的正交光图案化技术，用于在偶氮聚合物P1上制造不相互干扰的双模图案。P1是一种独特的材料，它既表现出光致可逆的固-液转变，又具有良好的拉伸性。在正交光图案化的第一步中，通过由光致可逆固-液转变控制的掩膜纳米压印在P1薄膜上制造图案化的光子结构。在第二步中，将P1薄膜拉伸并用偏振光通过光掩膜照射，从而产生彩色偏振图案。特别地，双模图案中的光子结构和彩色偏振是不相互干扰的。双模图案的另一个特点是它们可以通过光、热或溶液再处理进行重写，这对于回收和重新编程很有用。这项研究为光图案化的新型材料和技术的开发开辟了一条途径。
