Narute Prashant, Sharbidre Rakesh S, Lee Chang Jun, Park Byong Chon, Jung Hyun-June, Kim Jae-Hyun, Hong Seong-Gu
Department of Nano Science, University of Science and Technology, Daejeon 34113, Republic of Korea.
Interdisciplinary Materials Measurement Institute, Korea Research Institute of Standards and Science, Daejeon 34113, Republic of Korea.
ACS Nano. 2022 Jun 28;16(6):9871-9882. doi: 10.1021/acsnano.2c04000. Epub 2022 Jun 6.
Wrinkled graphene offers many advantageous features resulting from modifying the structural and physical properties as well as the chemical reactivity of graphene. However, its inadequate transferability to other substrates has limited its usability. This paper reports a roll-based clean transfer approach that enables the damage-free and contamination-free transfer of large-area wrinkled graphene onto polymeric substrates without compromising the integrity of wrinkle structures. The method implements the simultaneous imidazole-assisted etching and doping of chemical vapor-deposited graphene to fabricate multilayer graphene on a thermoplastic polystyrene (PS) substrate coated with a water-soluble poly(4-styrenesulfonic acid) (PSS) sacrificial layer via a roll-based transfer process. The compliant PSS layer affords the conformal contact between the PS substrate and graphene during the wrinkle formation process, enabling the controllable fabrication of graphene wrinkle structures on a large area. The water-soluble properties of PSS simplify the typically difficult separation of wrinkled graphene from the PS substrate after its transfer onto a target substrate. This improves the transferability of wrinkled graphene, rendering the transfer process solvent-free and residue-free. This work demonstrates the feasibility of the formulated method by transferring centimeter-scale wrinkled graphene onto currently used transparent flexible substrates (i.e., polyethylene terephthalate and polydimethylsiloxane). The results indicate that the transferred wrinkled graphene possesses the desirable combination of superior stretchability, optical transmittance, sheet resistance, and electromechanical stability, rendering its suitable application to transparent flexible and stretchable electronics.
褶皱石墨烯通过改变石墨烯的结构、物理性质以及化学反应性而具有许多优势特性。然而，其向其他基底的转移能力不足限制了它的实用性。本文报道了一种基于辊压的清洁转移方法，该方法能够将大面积褶皱石墨烯无损且无污染地转移到聚合物基底上，同时不破坏褶皱结构的完整性。该方法通过基于辊压的转移工艺，实现了对化学气相沉积石墨烯的咪唑辅助蚀刻和掺杂，从而在涂覆有水溶性聚（4-苯乙烯磺酸）（PSS）牺牲层的热塑性聚苯乙烯（PS）基底上制备多层石墨烯。柔顺的PSS层在褶皱形成过程中使PS基底与石墨烯实现共形接触，从而能够在大面积上可控地制备石墨烯褶皱结构。PSS的水溶性简化了褶皱石墨烯转移到目标基底后从PS基底上通常较为困难的分离过程。这提高了褶皱石墨烯的转移能力，使转移过程无溶剂且无残留。通过将厘米级褶皱石墨烯转移到目前使用的透明柔性基底（即聚对苯二甲酸乙二酯和聚二甲基硅氧烷）上，这项工作证明了所提出方法的可行性。结果表明，转移后的褶皱石墨烯具有优异的拉伸性、光学透过率、薄层电阻和机电稳定性等理想特性组合，使其适用于透明柔性和可拉伸电子器件。
