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一种将磁性引入拓扑绝缘体BiSe的高效掺杂剂。

An Efficient Dopant for Introducing Magnetism into Topological Insulator BiSe.

作者信息

Wang Dan, Hu Cui-E, Liu Li-Gang, Zhang Min, Chen Xiang-Rong

机构信息

Institute of Atomic and Molecular Physics, Sichuan University, Chengdu 610065, China.

College of Physics and Electronic Engineering, Chongqing Normal University, Chongqing 400047, China.

出版信息

Materials (Basel). 2022 May 28;15(11):3864. doi: 10.3390/ma15113864.

DOI:10.3390/ma15113864
PMID:35683164
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC9181840/
Abstract

In this work, we obtained an effective way to introduce magnetism into topological insulators, and successfully fabricated single crystal C-BiSe. The structural, electrical and magnetic properties of non-magnetic element X (B, C and N) doped at Bi, Se1, Se2 and VDW gap sites of BiSe were studied by the first principles. It is shown that the impurity bands formed inside the bulk inverted energy gap near the Fermi level with C doping BiSe. Due to spin-polarized ferromagnetic coupling, the time inversion symmetry of BiSe is destroyed. Remarkably, C is the most effective dopant because of the magnetic moment produced by doping at all positions. The experiment confirmed that the remnant ferromagnetism Mr is related to the C concentration. Theoretical calculations and experiments confirmed that carbon-doped BiSe is ferromagnetic, which provides a plan for manipulating topological properties and exploring spintronic applications.

摘要

在这项工作中,我们获得了一种将磁性引入拓扑绝缘体的有效方法,并成功制备了单晶C-BiSe。通过第一性原理研究了非磁性元素X(B、C和N)掺杂在BiSe的Bi、Se1、Se2和范德华间隙位置时的结构、电学和磁学性质。结果表明,C掺杂BiSe时,在费米能级附近的体反转能隙内形成了杂质带。由于自旋极化铁磁耦合,BiSe的时间反演对称性被破坏。值得注意的是,C是最有效的掺杂剂,因为在所有位置掺杂都会产生磁矩。实验证实,剩余铁磁性Mr与C浓度有关。理论计算和实验证实,碳掺杂BiSe是铁磁性的,这为操纵拓扑性质和探索自旋电子学应用提供了一个方案。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/29f6/9181840/97b66fd79d60/materials-15-03864-g005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/29f6/9181840/2acd76b00bd1/materials-15-03864-g001.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/29f6/9181840/9aa5586c1d77/materials-15-03864-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/29f6/9181840/43b14aa4b4da/materials-15-03864-g003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/29f6/9181840/db64a03a9ec7/materials-15-03864-g004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/29f6/9181840/97b66fd79d60/materials-15-03864-g005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/29f6/9181840/2acd76b00bd1/materials-15-03864-g001.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/29f6/9181840/9aa5586c1d77/materials-15-03864-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/29f6/9181840/43b14aa4b4da/materials-15-03864-g003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/29f6/9181840/db64a03a9ec7/materials-15-03864-g004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/29f6/9181840/97b66fd79d60/materials-15-03864-g005.jpg

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本文引用的文献

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Heterostructured ferromagnet-topological insulator with dual-phase magnetic properties.具有双相磁特性的异质结构铁磁体-拓扑绝缘体。
RSC Adv. 2018 Feb 19;8(14):7785-7791. doi: 10.1039/c8ra00068a. eCollection 2018 Feb 14.
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Magnetizing topological surface states of BiSe with a CrI monolayer.用单层CrI使BiSe的拓扑表面态磁化。
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Proximity-induced magnetism and an anomalous Hall effect in BiSe/LaCoO: a topological insulator/ferromagnetic insulator thin film heterostructure.BiSe/LaCoO 中近邻诱导的磁性和反常 Hall 效应:拓扑绝缘体/铁磁绝缘体薄膜异质结。
Nanoscale. 2018 May 31;10(21):10041-10049. doi: 10.1039/c8nr02083c.
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Solution to the Hole-Doping Problem and Tunable Quantum Hall Effect in BiSe Thin Films.在 BiSe 薄膜中解决空穴掺杂问题和可调谐量子霍尔效应。
Nano Lett. 2018 Feb 14;18(2):820-826. doi: 10.1021/acs.nanolett.7b04033. Epub 2018 Jan 17.
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Intrinsic ferromagnetism and quantum transport transition in individual Fe-doped BiSe topological insulator nanowires.单个 Fe 掺杂 BiSe 拓扑绝缘体纳米线中的本征铁磁性和量子输运转变。
Nanoscale. 2017 Aug 31;9(34):12372-12378. doi: 10.1039/c7nr02807e.
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J Phys Condens Matter. 2016 Aug 24;28(33):336001. doi: 10.1088/0953-8984/28/33/336001. Epub 2016 Jun 28.
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