Hu Liyan, Feng Mingjie, Wang Xia, Liu Shunchang, Wu Jinpeng, Yan Bin, Lu Wenbo, Wang Fang, Hu Jin-Song, Xue Ding-Jiang
Beijing National Laboratory for Molecular Sciences (BNLMS), CAS Key Laboratory of Molecular Nanostructure and Nanotechnology, Institute of Chemistry, Chinese Academy of Sciences Beijing 100190 China
Key Laboratory of Magnetic Molecules and Magnetic Information Materials of Ministry of Education, School of Chemistry and Materials Science, Shanxi Normal University Taiyuan 030006 China.
Chem Sci. 2022 Apr 25;13(20):5944-5950. doi: 10.1039/d1sc07043f. eCollection 2022 May 25.
Solution processes have been widely used to construct chalcogenide-based thin-film optoelectronic and electronic devices that combine high performance with low-cost manufacturing. However, Ge(ii)-based chalcogenide thin films possessing great potential for optoelectronic devices have not been reported using solution-based processes; this is mainly attributed to the easy oxidation of intermediate Ge(ii) to Ge(iv) in the precursor solution. Here we report solution-processed deposition of Ge(ii)-based chalcogenide thin films in the case of GeSe and GeS films by introducing hypophosphorous acid as a suitable reducing agent and strong acid. This enables the generation of Ge(ii) from low-cost and stable GeO powders while suppressing the oxidation of Ge(ii) to Ge(iv) in the precursor solution. We further show that such solution processes can also be used to deposit GeSe S alloy films with continuously tunable bandgaps ranging from 1.71 eV (GeS) to 1.14 eV (GeSe) by adjusting the atomic ratio of S- to Se-precursors in solution, thus allowing the realization of optimal-bandgap single-junction photovoltaic devices and multi-junction devices.
溶液法已被广泛用于制造基于硫族化物的薄膜光电器件和电子器件,这些器件兼具高性能和低成本制造的特点。然而,尚未有报道采用溶液法制备具有巨大光电器件潜力的基于Ge(ii)的硫族化物薄膜;这主要归因于前驱体溶液中中间态Ge(ii)容易氧化为Ge(iv)。在此,我们报道了通过引入次磷酸作为合适的还原剂和强酸,在GeSe和GeS薄膜的情况下,采用溶液法沉积基于Ge(ii)的硫族化物薄膜。这使得能够从低成本且稳定的GeO粉末中生成Ge(ii),同时抑制前驱体溶液中Ge(ii)氧化为Ge(iv)。我们进一步表明,通过调整溶液中S前驱体与Se前驱体的原子比,这种溶液法还可用于沉积带隙在1.71 eV(GeS)至1.14 eV(GeSe)之间连续可调的GeSeS合金薄膜,从而实现最佳带隙的单结光伏器件和多结器件。