Brayman A A, Miller M W, Cox C
Bioelectromagnetics. 1987;8(1):57-72. doi: 10.1002/bem.2250080108.
Serial longitudinal and transverse sections were prepared from roots of Cucumis sativus and Cucurbita maxima that had been exposed/sham-exposed to 60-Hz electric fields for 0-2 days. Field exposures were selected to produce a 10-20% or a 70-80% growth inhibition in whole roots of both species. Cortical cell length and diameter were measured using a microscope and eyepiece micrometer; measurements were conducted "blind." In both species, inhibition of cellular elongation was associated with exposure to electric fields (EF). Cellular radial expansion was apparently unaffected by exposure to electric fields. The diameters of radially unexpanded or fully expanded C. sativus cortical cells were about 25-30% smaller than those of comparable cells in C. maxima roots. Previous studies of the relationship between rates of root growth and applied EF strength showed that the response thresholds of C. sativus and C. maxima differed by a similar relative amount. These results are consistent with the postulate that EF-induced effects in roots are elicited by induced transmembrane potentials.
从暴露/假暴露于60赫兹电场0至2天的黄瓜和南瓜根部制备连续的纵向和横向切片。选择电场暴露以在两种植物的整个根部产生10%-20%或70%-80%的生长抑制。使用显微镜和目镜测微计测量皮层细胞的长度和直径；测量是“盲法”进行的。在这两种植物中，细胞伸长的抑制与电场暴露有关。细胞径向扩张显然不受电场暴露的影响。未径向扩张或完全扩张的黄瓜皮层细胞的直径比南瓜根中类似细胞的直径小约25%-30%。先前关于根生长速率与施加的电场强度之间关系的研究表明，黄瓜和南瓜的响应阈值相差类似的相对量。这些结果与以下假设一致，即根中电场诱导的效应是由诱导的跨膜电位引起的。
