Gouveia José D, Morales-García Ángel, Viñes Francesc, Gomes José R B, Illas Francesc
CICECO - Aveiro Institute of Materials, Department of Chemistry, University of Aveiro, Campus Universitário de Santiago, 3810-193 Aveiro, Portugal.
Departament de Ciència de Materials i Química Física & Institut de Química Teòrica i Computacional (IQTCUB), Universitat de Barcelona, c/Martí i Franquès 1-11, 08028 Barcelona, Spain.
ACS Nano. 2022 Aug 23;16(8):12541-12552. doi: 10.1021/acsnano.2c04029. Epub 2022 Jul 22.
A high-throughput analysis based on density functional simulations underscores the viable epitaxial growth of MXenes by alternating nitrogen and metal adlayers. This is supported by an exhaustive analysis of a number of thermodynamic and kinetic thresholds belonging to different critical key steps in the course of the epitaxial growth. The results on 18 pristine N- and C-based MXenes with MX stoichiometry reveal an easy initial N fixation and dissociation, where N adsorption is controlled by the MXene surface charge and metal d-band center and its dissociation controlled by the reaction energy change. Furthermore, formation energies indicate the plausible formation of N-terminated MXN MXenes. Moreover, the further covering with metal adlayers is found to be thermodynamically driven and stable, especially when using early transition metal atoms. The most restrictive analyzed criterion is the N adsorption and dissociation at nearly full N-covered adlayers, which is yet achievable for almost half of the explored MX seeds. The present results unfold the possibility of expanding, controlling, and tuning the composition, width, and structure of the MXene family.
基于密度泛函模拟的高通量分析强调了通过交替沉积氮和金属吸附层实现MXene外延生长的可行性。这得到了对外延生长过程中不同关键步骤的多个热力学和动力学阈值的详尽分析的支持。对18种具有MX化学计量比的原始N基和C基MXene的研究结果表明,初始阶段N的固定和解离较为容易,其中N的吸附受MXene表面电荷和金属d带中心控制,其解离受反应能量变化控制。此外,生成能表明了N端基MXN MXene的合理形成。此外,发现用金属吸附层进一步覆盖是由热力学驱动且稳定的,特别是在使用早期过渡金属原子时。分析的最具限制性的标准是在几乎完全被N覆盖的吸附层上的N吸附和解离,对于几乎一半的探索的MX种子来说这仍然是可以实现的。目前的结果揭示了扩展、控制和调整MXene家族的组成、宽度和结构的可能性。