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卤化抗生素抗性基因增殖的源头预防:紫外线/亚硫酸盐高级还原过程实现了对氟苯尼考抗菌活性的精准高效消除。

Source prevention of halogenated antibiotic resistance genes proliferation: UV/sulfite advanced reduction process achieved accurate and efficient elimination of florfenicol antibacterial activity.

作者信息

Ding Yangcheng, Han Jinglong, Feng Huajun, Liang Yuxiang, Jiang Wenli, Liu Shuhao, Liang Bin, Wang Meizhen, Li Zhiling, Wang Aijie, Ren Nanqi

机构信息

School of Environmental Science and Engineering, Zhejiang Gongshang University, Hangzhou 310018, PR China; Key Laboratory of Environmental Biotechnology, Research Center for Eco-Environmental Sciences, Chinese Academy of Sciences, Beijing 100085, PR China; School of Statistics and Mathematics, Zhejiang Gongshang University, Hangzhou 310018, PR China.

State Key Lab of Urban Water Resource and Environment, School of Civil and Environmental Engineering, Harbin Institute of Technology Shenzhen, Shenzhen 518055, PR China.

出版信息

Sci Total Environ. 2022 Nov 25;849:157844. doi: 10.1016/j.scitotenv.2022.157844. Epub 2022 Aug 5.

Abstract

The production and consumption of halogenated antibiotics, such as florfenicol (FLO), remain high, accompanied by a large amount of antibiotic-containing wastewater, which would induce the potential proliferation and transmission of antibiotic resistance genes (ARGs) in conventional biological systems. This study revealed that the introduction of reductive species (mainly H) by adding sulfite during UV irradiation process accelerated the decomposition rate of FLO, increasing from 0.1379 min in the single UV photolytic system to 0.3375 min in the UV/sulfite system. The enhanced photodecomposition in UV/sulfite system was attributed to the improved dehalogenation performance and additional removal of sulfomethyl group at the site of the benzene ring, which were the representative structures consisting of FLO antibacterial activity. Compared with single UV photolysis, UV/sulfite advanced reduction process saved the light energy requirement by 40 % for the evolutionary suppression of floR, and its corresponding class of ARGs in subsequent biotreatment system was controlled at the level of the negative group. Compared with UV/HO and UV/persulfate systems, the decomposition rate of FLO in the UV/S system was the highest and preserved the corresponding carbon source of the coexisting organic compounds for the potential utilization of microbial metabolism in subsequent biotreatment process. These results demonstrated that UV/sulfite advanced reduction process could be adopted as a promising pretreatment option for the source prevention of representative ARGs proliferation of halogenated antibiotics in subsequent biotreatment process.

摘要

氟苯尼考(FLO)等卤代抗生素的生产和消费量仍然很高,同时伴随着大量含抗生素废水的产生,这可能会导致传统生物系统中抗生素抗性基因(ARGs)的潜在增殖和传播。本研究表明,在紫外线照射过程中添加亚硫酸盐引入还原性物质(主要是H),加速了FLO的分解速率,从单一紫外光解系统中的0.1379 min提高到紫外/亚硫酸盐系统中的0.3375 min。紫外/亚硫酸盐系统中光分解增强归因于脱卤性能的改善以及苯环位点处磺甲基的额外去除,这些是构成FLO抗菌活性的代表性结构。与单一紫外光解相比,紫外/亚硫酸盐高级还原过程在后续生物处理系统中对floR及其相应ARGs的进化抑制节省了40%的光能需求,并且其在后续生物处理系统中相应的ARGs水平被控制在阴性组水平。与紫外/羟基自由基和紫外/过硫酸盐系统相比,紫外/亚硫酸盐系统中FLO的分解速率最高,并且保留了共存有机化合物的相应碳源,以供后续生物处理过程中微生物代谢潜在利用。这些结果表明,紫外/亚硫酸盐高级还原过程可作为一种有前景的预处理方法,用于在后续生物处理过程中从源头上预防卤代抗生素代表性ARGs的增殖。

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