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通过紫外线辐照同时提高聚偏氟乙烯薄膜的击穿强度和介电常数以实现高储能密度

Concurrent Enhancement of Breakdown Strength and Dielectric Constant in Poly(vinylidene Fluoride) Film with High Energy Storage Density by Ultraviolet Irradiation.

作者信息

Liu Hexing, Li Bao-Wen, Chen Jiayu, Shen Zhonghui, Zhang Xin, Wang Jing, Nan Ce-Wen

机构信息

State Key Laboratory of Silicate Materials for Architectures, School of Materials Science and Engineering, Wuhan University of Technology, Wuhan 430070, China.

State Key Laboratory of Advanced Technology for Materials Synthesis and Processing, Center of Smart Materials and Devices, Wuhan University of Technology, Wuhan 430070, China.

出版信息

ACS Omega. 2022 Jul 22;7(30):25999-26004. doi: 10.1021/acsomega.1c07373. eCollection 2022 Aug 2.

Abstract

Polyvinylidene fluoride (PVDF) film with high energy storage density has exhibited great potential for applications in modern electronics, particle accelerators, and pulsed lasers. Typically, dielectric/ferroelectric properties of PVDF film have been tailored for energy storage through stretching, annealing, and defect modification. Here, PVDF films were prepared by the solution casting method followed by an ultraviolet (UV) irradiation process, with special emphasis on how such treatment influences their dielectric and energy storage properties. Upon UV irradiation, the dielectric constant and breakdown strength of the PVDF film were enhanced simultaneously. A high energy density of 18.6 J/cm, along with a charge-discharge efficiency of 81% at 600 MV/m, was achieved in PVDF after exposure to UV for 15 min. This work may provide a simple and yet effective route to enhance energy storage density of PVDF-based polymers.

摘要

具有高储能密度的聚偏氟乙烯(PVDF)薄膜在现代电子、粒子加速器和脉冲激光器等领域展现出了巨大的应用潜力。通常,PVDF薄膜的介电/铁电性能已通过拉伸、退火和缺陷改性等方法进行调整以用于能量存储。在此,采用溶液浇铸法制备PVDF薄膜,随后进行紫外线(UV)辐照处理,特别关注这种处理如何影响其介电和储能性能。经紫外线辐照后,PVDF薄膜的介电常数和击穿强度同时提高。在PVDF薄膜经15分钟紫外线辐照后,实现了18.6 J/cm的高能量密度以及在600 MV/m下81%的充放电效率。这项工作可能为提高基于PVDF的聚合物的储能密度提供一种简单而有效的途径。

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