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掺TaN的ZrB和ZrB-SiC陶瓷的微观结构与纳米压痕研究

Microstructural and nanoindentation study of TaN incorporated ZrB and ZrB-SiC ceramics.

作者信息

Delbari Seyed Ali, Namini Abbas Sabahi, Lee Seonyong, Jung Sunghoon, Wang Jinghan, Lee Sea-Hoon, Cha Joo Hwan, Cho Jin Hyuk, Jang Ho Won, Kim Soo Young, Shokouhimehr Mohammadreza

机构信息

Department of Engineering Sciences, Faculty of Advanced Technologies, University of Mohaghegh Ardabili, Ardabil, Iran.

Department of Materials Science and Engineering, Research Institute of Advanced Materials, Seoul National University, Seoul, 08826, Republic of Korea.

出版信息

Sci Rep. 2022 Aug 12;12(1):13765. doi: 10.1038/s41598-022-17797-6.

DOI:10.1038/s41598-022-17797-6
PMID:35962129
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC9374782/
Abstract

This study assessed the sinterability and microstructure of ZrB-SiC-TaN and ZrB-TaN ceramics. Spark plasma sintering at 2000 °C and 30 MPa for 5 min produced both ceramics. The relative density of ZrB ceramic containing TaN was 95.3%; the addition of SiC increased this value to 98.1%. SiC's contribution to the elimination of ZrB surface oxides was the primary factor in the advancement of densification. The in situ formation of hexagonal boron nitride at the interface of TaN and ZrB was confirmed by high-resolution transmission electron microscopy, field emission-electron probe microanalyzer, X-ray diffractometry, and field emission scanning electron microscopy. Moreover, the in situ graphite might be produced as a byproduct of the SiC-SiO process, hence boosting the reduction of oxide compounds in the ternary system. The SiC compound had the highest hardness (29 ± 3 GPa), while the ZrB/TaN interface exhibited the greatest values of elastic modulus (473 ± 26 GPa) and stiffness (0.76 ± 0.13 mN/nm).

摘要

本研究评估了ZrB - SiC - TaN和ZrB - TaN陶瓷的烧结性和微观结构。在2000°C和30MPa条件下进行5分钟的放电等离子烧结制备了这两种陶瓷。含TaN的ZrB陶瓷的相对密度为95.3%；添加SiC后该值提高到98.1%。SiC对消除ZrB表面氧化物的作用是致密化进程推进的主要因素。通过高分辨率透射电子显微镜、场发射电子探针微分析仪、X射线衍射仪和场发射扫描电子显微镜证实了TaN与ZrB界面处原位形成了六方氮化硼。此外，原位石墨可能是SiC - SiO过程的副产物，从而促进了三元体系中氧化物化合物的还原。SiC化合物硬度最高（29±3 GPa），而ZrB/TaN界面的弹性模量（473±26 GPa）和刚度（0.76±0.13 mN/nm）值最大。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/73d0/9374782/43cbbcf80ee3/41598_2022_17797_Fig9_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/73d0/9374782/663e2c6daa51/41598_2022_17797_Fig1_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/73d0/9374782/9173e6908581/41598_2022_17797_Fig2_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/73d0/9374782/319e726937ac/41598_2022_17797_Fig3_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/73d0/9374782/90449de0f961/41598_2022_17797_Fig4_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/73d0/9374782/61521035ad40/41598_2022_17797_Fig5_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/73d0/9374782/adbdd95384f5/41598_2022_17797_Fig6_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/73d0/9374782/a6616479f72f/41598_2022_17797_Fig7_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/73d0/9374782/f351a68e1d25/41598_2022_17797_Fig8_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/73d0/9374782/43cbbcf80ee3/41598_2022_17797_Fig9_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/73d0/9374782/663e2c6daa51/41598_2022_17797_Fig1_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/73d0/9374782/9173e6908581/41598_2022_17797_Fig2_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/73d0/9374782/319e726937ac/41598_2022_17797_Fig3_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/73d0/9374782/90449de0f961/41598_2022_17797_Fig4_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/73d0/9374782/61521035ad40/41598_2022_17797_Fig5_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/73d0/9374782/adbdd95384f5/41598_2022_17797_Fig6_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/73d0/9374782/a6616479f72f/41598_2022_17797_Fig7_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/73d0/9374782/f351a68e1d25/41598_2022_17797_Fig8_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/73d0/9374782/43cbbcf80ee3/41598_2022_17797_Fig9_HTML.jpg

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