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高能计算机断层扫描作为原位监测高压反应器内传质过程的前瞻性工具——以包括氮化镓在内的氮化物的常压晶体生长为例

High-Energy Computed Tomography as a Prospective Tool for In Situ Monitoring of Mass Transfer Processes inside High-Pressure Reactors-A Case Study on Ammonothermal Bulk Crystal Growth of Nitrides including GaN.

作者信息

Schimmel Saskia, Salamon Michael, Tomida Daisuke, Neumeier Steffen, Ishiguro Tohru, Honda Yoshio, Chichibu Shigefusa F, Amano Hiroshi

机构信息

Friedrich-Alexander-Universität Erlangen-Nürnberg, Crystal Growth Lab, Materials for Electronics and Energy Technology (i-MEET), Martensstraße 7, 91058 Erlangen, Germany.

Fraunhofer IIS, Fraunhofer Institute for Integrated Circuits IIS, Division Development Center X-ray Technology, 90768 Fürth, Germany.

出版信息

Materials (Basel). 2022 Sep 5;15(17):6165. doi: 10.3390/ma15176165.

Abstract

For the fundamental understanding and the technological development of the ammonothermal method for the synthesis and crystal growth of nitrides, an in situ monitoring technique for tracking mass transport of the nitride throughout the entire autoclave volume is desirable. The feasibility of using high-energy computed tomography for this purpose was therefore evaluated using ex situ measurements. Acceleration voltages of 600 kV were estimated to yield suitable transparency in a lab-scale ammonothermal setup for GaN crystal growth designed for up to 300 MPa operating pressure. The total scan duration was estimated to be in the order of 20 to 40 min, which was sufficient given the comparatively slow crystal growth speed in ammonothermal growth. Even shorter scan durations or, alternatively, lower acceleration voltages for improved contrast or reduced X-ray shielding requirements, were estimated to be feasible in the case of ammonoacidic growth, as the lower pressure requirements for this process variant allow for thinned autoclave walls in an adapted setup designed for improved X-ray transparency. Promising nickel-base and cobalt-base alloys for applications in ammonothermal reactors with reduced X-ray absorption in relation to the maximum operating pressure were identified. The applicability for the validation of numerical simulations of the growth process of GaN, in addition to the applicability of the technique to further nitride materials, as well as larger reactors and bulk crystals, were evaluated.

摘要

为了从根本上理解氨热法合成和生长氮化物的技术发展,需要一种原位监测技术来跟踪氮化物在整个高压釜中的质量传输。因此,通过非原位测量评估了使用高能计算机断层扫描实现这一目的的可行性。据估计,在设计用于高达300MPa工作压力的氮化镓晶体生长的实验室规模氨热装置中,600kV的加速电压可产生合适的透明度。总扫描时间估计约为20至40分钟,鉴于氨热生长中相对较慢的晶体生长速度,这是足够的。据估计,在氨酸性生长的情况下,甚至更短的扫描时间,或者为了提高对比度或降低X射线屏蔽要求而采用较低的加速电压也是可行的,因为该工艺变体对压力的要求较低,在为提高X射线透明度而设计的适配装置中可以使用更薄的高压釜壁。确定了在氨热反应器中应用前景良好的镍基和钴基合金,它们相对于最大工作压力具有降低的X射线吸收。除了该技术对其他氮化物材料、更大的反应器和块状晶体的适用性外,还评估了其对氮化镓生长过程数值模拟验证中的适用性。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b769/9457664/a8280f1a6d7f/materials-15-06165-g001.jpg

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