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利用氨热法合成储量丰富的氮化物半导体ZnSiN和ZnGeN并通过原位X射线成像监测溶解过程

Ammonothermal Synthesis of Earth-Abundant Nitride Semiconductors ZnSiN and ZnGeN and Dissolution Monitoring by In Situ X-ray Imaging.

作者信息

Häusler Jonas, Schimmel Saskia, Wellmann Peter, Schnick Wolfgang

机构信息

Department of Chemistry, University of Munich (LMU), Butenandtstr. 5-13 (D), 81377, Munich, Germany.

Materials Department 6, Friedrich-Alexander-University, Erlangen-Nürnberg (FAU), Martensstr. 7, 91058, Erlangen, Germany.

出版信息

Chemistry. 2017 Sep 7;23(50):12275-12282. doi: 10.1002/chem.201701081. Epub 2017 May 15.

Abstract

In this contribution, first synthesis of semiconducting ZnSiN and ZnGeN from solution is reported with supercritical ammonia as solvent and KNH as ammonobasic mineralizer. The reactions were conducted in custom-built high-pressure autoclaves made of nickel-based superalloy. The nitrides were characterized by powder X-ray diffraction and their crystal structures were refined by the Rietveld method. ZnSiN (a=5.24637(4), b=6.28025(5), c=5.02228(4) Å, Z=4, R =0.0556) and isotypic ZnGeN (a=5.46677(10), b=6.44640(12), c=5.19080(10) Å, Z=4, R =0.0494) crystallize in the orthorhombic space group Pna2 (no. 33). The morphology and elemental composition of the nitrides were examined by electron microscopy and energy-dispersive X-ray spectroscopy (EDX). Well-defined single crystals with a diameter up to 7 μm were grown by ammonothermal synthesis at temperatures between 870 and 1070 K and pressures up to 230 MPa. Optical properties have been analyzed with diffuse reflectance measurements. The band gaps of ZnSiN and ZnGeN were determined to be 3.7 and 3.2 eV at room temperature, respectively. In situ X-ray measurements were performed to exemplarily investigate the crystallization mechanism of ZnGeN . Dissolution in ammonobasic supercritical ammonia between 570 and 670 K was observed which is quite promising for the crystal growth of ternary nitrides under ammonothermal conditions.

摘要

在本论文中,首次报道了以超临界氨为溶剂、KNH为氨碱性矿化剂从溶液中合成半导体ZnSiN和ZnGeN。反应在由镍基高温合金制成的定制高压釜中进行。通过粉末X射线衍射对氮化物进行表征,并采用Rietveld方法对其晶体结构进行精修。ZnSiN(a = 5.24637(4),b = 6.28025(5),c = 5.02228(4) Å,Z = 4,R = 0.0556)和同型的ZnGeN(a = 5.46677(10),b = 6.44640(12),c = 5.19080(10) Å,Z = 4,R = 0.0494)结晶于正交空间群Pna2(编号33)。通过电子显微镜和能量色散X射线光谱(EDX)对氮化物的形貌和元素组成进行了研究。在870至1070 K的温度和高达230 MPa的压力下,通过热氨法合成了直径达7 μm的规则单晶。利用漫反射测量对光学性质进行了分析。室温下,ZnSiN和ZnGeN的带隙分别测定为3.7和3.2 eV。进行了原位X射线测量以示例性地研究ZnGeN的结晶机理。观察到在570至670 K的氨碱性超临界氨中发生溶解,这对于热氨条件下三元氮化物的晶体生长很有前景。

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