Liang Suzhe, Schwartzkopf Matthias, Roth Stephan V, Müller-Buschbaum Peter
Technische Universität München, Lehrstuhl für Funktionelle Materialien, Physik-Department James-Franck-Str 1 85748 Garching Germany
Deutsches Elektronen-Synchrotron DESY Notkestr. 85 22607 Hamburg Germany.
Nanoscale Adv. 2022 Mar 25;4(12):2533-2560. doi: 10.1039/d2na00127f. eCollection 2022 Jun 14.
Fabrication of ultra-thin gold (Au) layers (UTGLs) has been regarded as the key technique to achieve applications with tunable optical response, flexible sensors and electronic devices. Various strategies have been developed to optimize the wetting process of Au, resulting in the formation of UTGLs at a minimum thickness. The related studies on UTGLs attracted huge attention in recent years. On the one hand, the growth processes of UTGLs on different substrates were in-depth probed by advanced characterization techniques and the effects of optimization strategies on the growth of UTGLs were also revealed. On the other hand, based on the understanding of the growth behavior and the assistance of optimization strategies, various applications of UTGLs were realized based on optical/plasmon responses, surface-enhanced Raman scattering and as electrodes for various sensors and electronic devices, as well as being seed layers for thin film growth. In this focused review, both the fundamental and practical studies on UTGLs in the most recent years are elaborated in detail. The growth processes of UTGLs revealed by characterization techniques, such as grazing-incidence small-angle X-ray scattering (GISAXS), as well as the state of the art of UTGL-based applications, are reviewed.
超薄金(Au)层(UTGLs)的制备被视为实现具有可调谐光学响应的应用、柔性传感器和电子设备的关键技术。人们已经开发出各种策略来优化金的润湿过程,从而以最小厚度形成UTGLs。近年来,关于UTGLs的相关研究引起了极大关注。一方面,先进的表征技术深入探究了UTGLs在不同基底上的生长过程,并且揭示了优化策略对UTGLs生长的影响。另一方面,基于对生长行为的理解以及优化策略的辅助,基于光学/等离子体响应、表面增强拉曼散射以及作为各种传感器和电子设备的电极,以及作为薄膜生长的种子层,实现了UTGLs的各种应用。在这篇重点综述中,详细阐述了近年来关于UTGLs的基础研究和实际研究。综述了通过掠入射小角X射线散射(GISAXS)等表征技术揭示的UTGLs的生长过程,以及基于UTGLs的应用的现状。