Zhao Yuanhang, Li Zizheng, Liu Xiaoyi, Wang Kai, Sun Yuqi, Yang Haigui, Wang Xiaoyi, Wang Tongtong, Song Naitao, Gao Jinsong
Opt Express. 2022 Jun 20;30(13):22820-22829. doi: 10.1364/OE.453155.
In this paper, we proposed a double-layer all-dielectric grating. Under the premise of ensuring the strength of the resonance peak, the upper SiO grating layer suppresses the tendency of high-order dipole resonance excitation and improves the transmittance at the non-resonant position (T > 99%). The distribution of chromaticity coordinates on the CIE 1931 chromaticity diagram also proves that suppressing side peaks can effectively increase the saturation of structural colors, which is essential for a high precision imaging system. The cyclic displacement current excites the magnetic dipole resonance, which causes the magnetic field to be confined in the high refractive index material HfO grating layer. By adjusting the duty cycle of the grating structure, a reflection spectrum with low full width half maximum (FWHM) (∼2 nm) and high-quality factor Q (∼424.5 nm) can be obtained. And the spectral intensity is more sensitive to the polarization angle. This work is of great significance to the development of sensors, display imaging and other fields. At the same time, the material of the grating filter meets the requirements of high damage threshold of the high-power laser system, and its high-power laser application potential is inestimable.
在本文中,我们提出了一种双层全介质光栅。在确保共振峰强度的前提下,上层SiO光栅层抑制了高阶偶极子共振激发的趋势,并提高了非共振位置的透过率(T>99%)。CIE 1931色度图上色度坐标的分布也证明,抑制边峰可以有效地提高结构色的饱和度,这对于高精度成像系统至关重要。循环位移电流激发磁偶极子共振,使磁场局限于高折射率材料HfO光栅层中。通过调整光栅结构的占空比,可以获得半高宽(FWHM)低(约2nm)且品质因数Q高(约424.5nm)的反射光谱。并且光谱强度对偏振角更为敏感。这项工作对传感器、显示成像等领域的发展具有重要意义。同时,光栅滤波器的材料满足高功率激光系统高损伤阈值的要求,其高功率激光应用潜力不可估量。