Lee Ye-Seul, Yoon Ji-Hyeon, Raji Akeem, Baek Seung-Yo, Choi Yoonseuk, Lee Jonghee, Gasonoo Akpeko, Lee Jae-Hyun
Department of Creative Convergence Engineering, Hanbat National University, 125 Dongseo-daero, Daejeon 34158, Korea.
Department of Electronic Engineering, Hanbat National University, 125 Dongseo-daero, Daejeon 34158, Korea.
Materials (Basel). 2022 Sep 27;15(19):6717. doi: 10.3390/ma15196717.
Poly-dichloro-para-xylylene (parylene-C) film is formed through a chemical vapor deposition process, where monomeric gases are polymerized on the target surface at room temperature and are used as transparent insulating coating films. The thin parylene-C films exhibit uniform conformal layers even when deposited on substrates or surfaces with fine cracks, structures, and bumps. However, the film is highly transparent in the visible range (transmittance > 90%); thus, it is difficult to visually identify, inspect the coating process and check for any defects when used as an insulation film. Some reports have demonstrated the deposition of visible (hazy) parylene films through the control of the vaporization or pyrolysis of the parylene-C powder and sublimed dimers, respectively. Even though these films have been applied as device substrates and light extraction layers in organic light-emitting diodes (OLEDs), their optical and electrical characteristics have not been extensively explored, especially for their applications as insulation coatings. In this study, the characteristics of visible parylene films produced by tuning the ratio of dimer to monomer gases via the adjustments of the pyrolysis temperature are analyzed with electrical and optical methods. Parylene-C films deposited within the pyrolysis temperature of 400−700 °C exhibited a haze range of 10−90%. A relative reflectance of 18.8% at 550 nm of the visible light region was achieved in the visible parylene film deposited with a pyrolysis temperature of 400 °C. Resistivity in the order of 1010 Ω cm was achieved for the visible parylene films measured with the transmission line measurement (TLM) method. The films can be applied in advanced insulation coatings for various optical systems and electronic devices.
聚二氯对二甲苯(聚对二甲苯-C)薄膜是通过化学气相沉积工艺形成的,在该工艺中,单体气体在室温下于目标表面聚合,并用作透明绝缘涂层薄膜。即使沉积在带有细微裂缝、结构和凸起的基材或表面上,聚对二甲苯-C薄膜也能呈现出均匀的保形层。然而,该薄膜在可见光范围内具有高透明度(透光率>90%);因此,当用作绝缘薄膜时,很难通过视觉识别、检查涂覆过程以及检测任何缺陷。一些报告分别通过控制聚对二甲苯-C粉末的汽化或热解以及升华二聚体,证明了可见(雾状)聚对二甲苯薄膜的沉积。尽管这些薄膜已被应用于有机发光二极管(OLED)的器件基板和光提取层,但其光学和电学特性尚未得到广泛研究,尤其是在其作为绝缘涂层的应用方面。在本研究中,通过电学和光学方法分析了通过调整热解温度来调节二聚体与单体气体比例所制备的可见聚对二甲苯薄膜的特性。在400−700°C热解温度范围内沉积的聚对二甲苯-C薄膜的雾度范围为10−90%。在热解温度为400°C沉积的可见聚对二甲苯薄膜中,在可见光区域550nm处实现了18.8%的相对反射率。用传输线测量(TLM)方法测量的可见聚对二甲苯薄膜的电阻率达到了1010Ω·cm量级。这些薄膜可应用于各种光学系统和电子设备的先进绝缘涂层。