Ganguly Arnab, Das Gobind
Department of Physics, Khalifa University, Abu Dhabi 12788, United Arab Emirates.
Nanomaterials (Basel). 2022 Oct 4;12(19):3464. doi: 10.3390/nano12193464.
In this article, we present a systematic investigation on a multistep nanosphere lithography technique to uncover its potential in fabricating a wide range of two- and three-dimensional nanostructures. A tilted (polar angle) electron beam shower on a nanosphere mask results in an angled shadow mask deposition. The shape of the shadow also depends on the azimuthal angle of the mask sitting on top of the substrate. We performed angled shadow mask depositions with systematic variation of these two angular parameters, giving rise to complex nanostructures (down to 50 nm), repeated over a large area without defect. In this article, nanosphere lithography with two- and four-fold azimuthal symmetry was studied at constant tilt angles followed by variations in tilt without azimuthal rotation of the substrate. Finally, both angular parameters were simultaneously varied. The structure of shadow crystals was explained using Matlab simulation. This work stretches the horizons of nanosphere lithography, opening up new scopes in plasmonic and magnonic research.
在本文中，我们对一种多步纳米球光刻技术进行了系统研究，以揭示其在制造各种二维和三维纳米结构方面的潜力。纳米球掩膜上倾斜（极角）的电子束喷淋会导致倾斜的阴影掩膜沉积。阴影的形状还取决于位于衬底上方的掩膜的方位角。我们通过系统改变这两个角度参数进行倾斜阴影掩膜沉积，从而产生复杂的纳米结构（低至50纳米），并在大面积上无缺陷地重复出现。在本文中，我们在恒定倾斜角度下研究了具有二重和四重方位对称性的纳米球光刻，随后在不旋转衬底方位的情况下改变倾斜角度。最后，同时改变这两个角度参数。利用Matlab模拟对阴影晶体的结构进行了解释。这项工作拓展了纳米球光刻的视野，为等离子体和磁子学研究开辟了新的领域。
