Shao Feng, Xia Zhaoming, You Futian, Wong Jun Kit, Low Qi Hang, Xiao Hai, Yeo Boon Siang
State Key Laboratory of Materials-Oriented Chemical Engineering, College of Chemical Engineering, Nanjing Tech University, Nanjing, 211816, China.
Department of Chemistry, Faculty of Science, National University of Singapore, 3 Science Drive 3, Singapore, 117543, Singapore.
Angew Chem Int Ed Engl. 2023 Jan 16;62(3):e202214210. doi: 10.1002/anie.202214210. Epub 2022 Dec 8.
We have employed in situ electrochemical shell-isolated nanoparticle-enhanced Raman spectroscopy (SHINERS) and density functional theory (DFT) calculations to study the CO reduction reaction (CORR) on Cu single-crystal surfaces under various conditions. Coadsorbed and structure-/potential-dependent surface species, including *CO, Cu-O , and Cu-OH , were identified using electrochemical spectroscopy and isotope labeling. The relative abundance of *OH follows a "volcano" trend with applied potentials in aqueous solutions, which is yet absent in absolute alcoholic solutions. Combined with DFT calculations, we propose that the surface H O can serve as a strong proton donor for the first protonation step in both the C and C pathways of CORR at various applied potentials in alkaline electrolytes, leaving adsorbed *OH on the surface. This work provides fresh insights into the initial protonation steps and identity of key interfacial intermediates formed during CORR on Cu surfaces.
我们采用原位电化学壳层隔离纳米粒子增强拉曼光谱(SHINERS)和密度泛函理论(DFT)计算,研究了不同条件下铜单晶表面上的一氧化碳还原反应(CORR)。利用电化学光谱和同位素标记法,确定了共吸附的、与结构/电位相关的表面物种,包括*CO、Cu - O和Cu - OH。OH的相对丰度在水溶液中随外加电位呈“火山”趋势,而在纯醇溶液中则不存在这种趋势。结合DFT计算,我们提出,在碱性电解质中不同外加电位下,表面H₂O可作为CORR的C - O和C - C途径中第一步质子化的强质子供体,在表面留下吸附的OH。这项工作为铜表面CORR过程中初始质子化步骤和关键界面中间体的特性提供了新的见解。