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通过外延生长的二维有机晶体对单层二硫化钼进行高效钝化。

Efficient passivation of monolayer MoS by epitaxially grown 2D organic crystals.

作者信息

Xu Xin, Chen Zefeng, Sun Beilei, Zhao Yu, Tao Li, Xu Jian-Bin

机构信息

Department of Electronic Engineering, The Chinese University of Hong Kong, Hong Kong, China.

Department of Electronic Engineering, The Chinese University of Hong Kong, Hong Kong, China; Guangdong Provincial Key Laboratory of Functional Soft Condensed Matter, School of Material and Energy, Guangdong University of Technology, Guangzhou 510006, China.

出版信息

Sci Bull (Beijing). 2019 Nov 30;64(22):1700-1706. doi: 10.1016/j.scib.2019.09.009. Epub 2019 Sep 9.

Abstract

Monolayer molybdenum disulfide (MoS) is considered to be a promising candidate for field-effect transistors and photodetectors due to its direct bandgap and atomically thin properties. However, the MoS devices are impeded by the intrinsic surface defects and environmental adsorption such as HO and O. Here, we demonstrated a highly ordered, ultrathin (<5 nm) and scalable N,N'-ditridecylperylene-3,4,9,10-tetracarboxylic diimide (PTCDI-C13) passivation layer that can be epitaxially grown on MoS. The van der Waals interface between PTCDI-C13 and MoS can efficiently reduce the surface traps and isolate MoS from ambient. As a result, the passivated devices exhibit huge improvement in both carrier mobility (from 0.5 to 8.3 cm/(V s)) and sub-threshold swing (from 16.7 to 1.6 V/dec). Also, the photodetector made on MoS after passivation has a much faster response speed (from 3 s to 10 ms) without significant sacrifice of the responsivity. Our method provides a facile approach to realize high-performance two-dimensional electronic and optoelectronic devices.

摘要

单层二硫化钼(MoS)因其直接带隙和原子级薄的特性,被认为是场效应晶体管和光电探测器的一个有前途的候选材料。然而,MoS器件受到固有表面缺陷和诸如HO和O等环境吸附的阻碍。在此,我们展示了一种高度有序、超薄(<5nm)且可扩展的N,N'-二十二烷基苝-3,4,9,10-四羧酸二亚胺(PTCDI-C13)钝化层,其可以在MoS上外延生长。PTCDI-C13与MoS之间的范德华界面能够有效减少表面陷阱,并使MoS与环境隔离。结果,钝化后的器件在载流子迁移率(从0.5提高到8.3cm²/(V·s))和亚阈值摆幅(从16.7降低到1.6V/dec)方面都有巨大提升。此外,钝化后的MoS制成的光电探测器具有更快的响应速度(从3s提高到10ms),且响应度没有明显牺牲。我们的方法为实现高性能二维电子和光电器件提供了一种简便途径。

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