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刀片涂层条件对透明银纳米线电极电学和光学性能的影响。

Effect of the Blade-Coating Conditions on the Electrical and Optical Properties of Transparent Ag Nanowire Electrodes.

作者信息

Yoon Hyungsub, Matteini Paolo, Hwang Byungil

机构信息

School of Integrative Engineering, Chung-Ang University, Seoul 06974, Republic of Korea.

Institute of Applied Physics "Nello Carrara", National Research Council, 50019 Florence, Italy.

出版信息

Micromachines (Basel). 2022 Dec 31;14(1):114. doi: 10.3390/mi14010114.

Abstract

Optimizing the coating conditions for a doctor blading system is important when seeking to improve the performance of Ag nanowire electrodes. In this study, the effect of the blading height and speed on the optical and electrical properties of Ag nanowire electrodes was investigated. Ag nanowires were first spread on a PET substrate using a doctor blade with differing heights at a fixed blading speed. An increase in the blading height resulted in the degradation of the optical transmittance and stronger haze due to the higher probability of Ag nanowire agglomeration arising from the greater wet thickness. When the blading speed was varied, the optical transmittance and haze were unaffected up until 20 mm/s, followed by minor degradation of the optical properties at blading speeds over 25 mm/s. The higher speeds hindered the spread of the Ag nanowire solution, which also increased the probability of Ag nanowire agglomeration. However, this degradation was less serious compared to that observed with a change in the blading height. Therefore, optimizing the blading height was confirmed to be the priority for the production of high-performance transparent Ag nanowire electrodes. Our study thus provides practical guidance for the fabrication of Ag nanowire electrodes using doctor blading systems.

摘要

在寻求提高银纳米线电极性能时,优化刮涂系统的涂覆条件至关重要。在本研究中,研究了刮涂高度和速度对银纳米线电极光学和电学性能的影响。首先,使用刮涂器在固定刮涂速度下以不同高度将银纳米线铺展在PET基板上。刮涂高度的增加导致光学透过率下降和雾度增强,这是由于更大的湿膜厚度导致银纳米线团聚的可能性更高。当改变刮涂速度时,在20 mm/s之前,光学透过率和雾度不受影响,而在刮涂速度超过25 mm/s时,光学性能略有下降。较高的速度阻碍了银纳米线溶液的铺展,这也增加了银纳米线团聚的可能性。然而,与刮涂高度变化相比,这种性能下降不太严重。因此,优化刮涂高度被确认为生产高性能透明银纳米线电极的首要任务。我们的研究为使用刮涂系统制造银纳米线电极提供了实际指导。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/9e0b/9862827/cf2051b636f3/micromachines-14-00114-g001.jpg

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