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高压下MgFeH的第一性原理计算及储氢性能

First-principles calculations of MgFeH under high pressures and hydrogen storage properties.

作者信息

Ziani H, Gueddim A, Bouarissa N

机构信息

Materials Science and Informatics Laboratory, Faculty of Science, University of Djelfa, 17000, Djelfa, Algeria.

Laboratory of Materials Physics and Its Application, Faculty of Science, University of M'sila, 28000, M'sila, Algeria.

出版信息

J Mol Model. 2023 Jan 31;29(2):59. doi: 10.1007/s00894-023-05463-1.

Abstract

We report on structural properties, elastic constants, mechanical and dynamical stabilities, electronic band structure, and hydrogen storage applications of MgFeH at zero and high-pressure effects. The work has been realized within the full-potential linearized augmented plane wave method. At zero pressure, the material under study is stable and has a ductile nature. The electronic structure of the material of interest is determined to be X-X wide direct band gap semiconductor with an energy of 1.88 eV. The hydrogen storage capacity wt (%) and the hydrogen desorption temperature are reported as 5.473 and 625.47 K respectively. The Debye temperature ϴ is recorded as 698 K using the elastic constants and about 775 K using the Gibbs calculations. Under high-pressure effect up to 80 GPa, the semiconductor still be an X-X semiconductor with an energy gap of 3.91 eV. The Debye temperature ϴ increases monotonically up to about 1120 K at 80 GPa when using the calculated elastic constants whereas the desorption temperature decreases from 650 to 0 K by increasing pressure from 0 to about 87 GPa.

摘要

我们报告了零压力和高压效应下MgFeH的结构特性、弹性常数、力学和动力学稳定性、电子能带结构以及储氢应用。这项工作是在全势线性缀加平面波方法内完成的。在零压力下,所研究的材料是稳定的,具有延展性。所关注材料的电子结构被确定为具有1.88 eV能量的X-X型宽直接带隙半导体。储氢容量wt(%)和氢解吸温度分别报告为5.473和625.47 K。使用弹性常数记录的德拜温度ϴ为698 K,使用吉布斯计算约为775 K。在高达80 GPa的高压效应下,该半导体仍然是具有3.91 eV能隙的X-X型半导体。当使用计算出的弹性常数时,德拜温度ϴ在80 GPa时单调增加至约1120 K,而解吸温度随着压力从0增加到约87 GPa从650 K降至0 K。

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