Ziani H, Gueddim A, Bouarissa N
Materials Science and Informatics Laboratory, Faculty of Science, University of Djelfa, 17000, Djelfa, Algeria.
Laboratory of Materials Physics and Its Application, Faculty of Science, University of M'sila, 28000, M'sila, Algeria.
J Mol Model. 2023 Jan 31;29(2):59. doi: 10.1007/s00894-023-05463-1.
We report on structural properties, elastic constants, mechanical and dynamical stabilities, electronic band structure, and hydrogen storage applications of MgFeH at zero and high-pressure effects. The work has been realized within the full-potential linearized augmented plane wave method. At zero pressure, the material under study is stable and has a ductile nature. The electronic structure of the material of interest is determined to be X-X wide direct band gap semiconductor with an energy of 1.88 eV. The hydrogen storage capacity wt (%) and the hydrogen desorption temperature are reported as 5.473 and 625.47 K respectively. The Debye temperature ϴ is recorded as 698 K using the elastic constants and about 775 K using the Gibbs calculations. Under high-pressure effect up to 80 GPa, the semiconductor still be an X-X semiconductor with an energy gap of 3.91 eV. The Debye temperature ϴ increases monotonically up to about 1120 K at 80 GPa when using the calculated elastic constants whereas the desorption temperature decreases from 650 to 0 K by increasing pressure from 0 to about 87 GPa.
我们报告了零压力和高压效应下MgFeH的结构特性、弹性常数、力学和动力学稳定性、电子能带结构以及储氢应用。这项工作是在全势线性缀加平面波方法内完成的。在零压力下,所研究的材料是稳定的,具有延展性。所关注材料的电子结构被确定为具有1.88 eV能量的X-X型宽直接带隙半导体。储氢容量wt(%)和氢解吸温度分别报告为5.473和625.47 K。使用弹性常数记录的德拜温度ϴ为698 K,使用吉布斯计算约为775 K。在高达80 GPa的高压效应下,该半导体仍然是具有3.91 eV能隙的X-X型半导体。当使用计算出的弹性常数时,德拜温度ϴ在80 GPa时单调增加至约1120 K,而解吸温度随着压力从0增加到约87 GPa从650 K降至0 K。