State Key Laboratory of ASIC & System, School of Microelectronics, Fudan University, Shanghai200433, China.
ACS Appl Mater Interfaces. 2023 Feb 15;15(6):8691-8698. doi: 10.1021/acsami.2c20579. Epub 2023 Feb 1.
Wide band gap semiconductors keep on pushing the limits of power electronic devices to higher switching speeds and higher operating temperatures, including diodes and transistors on low-cost Si substrates. Alternatively, erasable conducting walls created within ferroelectric single-crystal films integrated on the Si platform have emerged as a promising gateway to adaptive nanoelectronics in sufficient output power, where the repetitive creation of highly charged domain walls (DWs) is particularly important to increase the wall current density. Here, we observe large conduction of the head-to-head DW at an optimized inclination angle of 15° within a LiNbO single crystal that is 3-4 orders of magnitude higher than that of the tail-to-tail DW. The wall conduction is diode-like with a linear current density of higher than 1 mA/μm and an on/off ratio of larger than 10 under the application of a repetitive switching voltage pulse in time less than 10 ns and an endurance number of higher than 10. The high-power diodes can not only perform direct data processing in high-density nonvolatile DW memories in fast operation speeds and low-energy consumption but also function as sensors in compact electromechanical systems, selectors in phase-change memory and resistive random-access memory, and half-wave/full-wave rectifiers in modern nanocircuits in dimensions approaching the thickness of the depletion layer below which the tradition p-n junction malfunctions.
宽带隙半导体不断推动功率电子器件向更高的开关速度和更高的工作温度发展,包括低成本 Si 衬底上的二极管和晶体管。或者,在 Si 平台上集成的铁电单晶薄膜中可擦除的导电壁的出现,为自适应纳米电子学提供了一条有前途的途径,在足够的输出功率下,重复创建高电荷畴壁 (DW) 尤为重要,以增加壁电流密度。在这里,我们在 LiNbO 单晶中观察到优化倾斜角为 15°时的头对头 DW 的大导通,其导通电流比尾对尾 DW 高 3-4 个数量级。壁导通具有类似于二极管的特性,在重复切换电压脉冲的应用下,电流密度高于 1 mA/μm,导通/关断比大于 10,时间小于 10 ns,耐久性大于 10。高功率二极管不仅可以在高速、低能耗下直接在高密度非易失性 DW 存储器中进行数据处理,还可以用作紧凑机电系统中的传感器、相变存储器和阻变随机存取存储器中的选择器,以及现代纳米电路中的半波/全波整流器,其尺寸接近传统 p-n 结出现故障的耗尽层厚度。